Scanning system for high-energy electron diffractometry

A. S. Avilov, A. K. Kuligin, U. Pietsch, John Spence, V. G. Tsirelson, J. M. Zuo

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

A new electron diffractometer with a diffraction-pattern scanning system in front of a fixed counter has been developed. Significant improvement was achieved in the measured diffraction intensities by using fast electronics and additional control of the stability of the electron beam. The measurement of and accounting for the gear-frequency characteristic of the registration system was performed, and the signal accumulation mode for intensity measurements together with advanced statistical data processing were employed. Good agreement between the experimental and Hartree-Fock structure factors for LiF, NaF and MgO was achieved (to avoid strong extinction effects, rather thin polycrystalline films were used as samples).

Original languageEnglish (US)
Pages (from-to)1033-1038
Number of pages6
JournalJournal of Applied Crystallography
Volume32
Issue number6
StatePublished - 1999

Fingerprint

high energy electrons
Electrons
Scanning
scanning
Diffractometers
diffractometers
Diffraction patterns
Gears
Electron beams
counters
extinction
Electronic equipment
diffraction patterns
Diffraction
electron beams
thin films
electronics
diffraction
electrons

ASJC Scopus subject areas

  • Structural Biology
  • Condensed Matter Physics

Cite this

Avilov, A. S., Kuligin, A. K., Pietsch, U., Spence, J., Tsirelson, V. G., & Zuo, J. M. (1999). Scanning system for high-energy electron diffractometry. Journal of Applied Crystallography, 32(6), 1033-1038.

Scanning system for high-energy electron diffractometry. / Avilov, A. S.; Kuligin, A. K.; Pietsch, U.; Spence, John; Tsirelson, V. G.; Zuo, J. M.

In: Journal of Applied Crystallography, Vol. 32, No. 6, 1999, p. 1033-1038.

Research output: Contribution to journalArticle

Avilov, AS, Kuligin, AK, Pietsch, U, Spence, J, Tsirelson, VG & Zuo, JM 1999, 'Scanning system for high-energy electron diffractometry', Journal of Applied Crystallography, vol. 32, no. 6, pp. 1033-1038.
Avilov AS, Kuligin AK, Pietsch U, Spence J, Tsirelson VG, Zuo JM. Scanning system for high-energy electron diffractometry. Journal of Applied Crystallography. 1999;32(6):1033-1038.
Avilov, A. S. ; Kuligin, A. K. ; Pietsch, U. ; Spence, John ; Tsirelson, V. G. ; Zuo, J. M. / Scanning system for high-energy electron diffractometry. In: Journal of Applied Crystallography. 1999 ; Vol. 32, No. 6. pp. 1033-1038.
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