Run-to-run control charts with contrasts

Research output: Contribution to journalArticle

9 Scopus citations

Abstract

In semiconductor manufacturing it is useful to design control charts to be sensitive to anticipated assignable causes. Process knowledge can be used to develop summaries for run-to-run control that are more sensitive to problems than traditional approaches. As the number of measurements recorded from a run increases, appropriate summaries derived from process knowledge become more important. Control charts based on linear contrasts are generated from partitions of a standard analysis of variance model. These contrasts simplify the development and interpretation of charts sensitized for specific assignable causes. The use of EWMA control charts for these statistics is described.

Original languageEnglish (US)
Pages (from-to)261-272
Number of pages12
JournalQuality and Reliability Engineering International
Volume14
Issue number4
DOIs
StatePublished - Aug 1998

Keywords

  • Average run length
  • Exponentially weighted moving average
  • Statistical process control

ASJC Scopus subject areas

  • Safety, Risk, Reliability and Quality
  • Management Science and Operations Research

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