Run-to-run control charts with contrasts

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

In semiconductor manufacturing it is useful to design control charts to be sensitive to anticipated assignable causes. Process knowledge can be used to develop summaries for run-to-run control that are more sensitive to problems than traditional approaches. As the number of measurements recorded from a run increases, appropriate summaries derived from process knowledge become more important. Control charts based on linear contrasts are generated from partitions of a standard analysis of variance model. These contrasts simplify the development and interpretation of charts sensitized for specific assignable causes. The use of EWMA control charts for these statistics is described.

Original languageEnglish (US)
Pages (from-to)261-272
Number of pages12
JournalQuality and Reliability Engineering International
Volume14
Issue number4
StatePublished - Aug 1998

Fingerprint

Analysis of variance (ANOVA)
Statistics
Semiconductor materials
Control charts
Knowledge processes
Charts
Analysis of variance
Semiconductor manufacturing
Exponentially weighted moving average

Keywords

  • Average run length
  • Exponentially weighted moving average
  • Statistical process control

ASJC Scopus subject areas

  • Engineering (miscellaneous)
  • Management Science and Operations Research

Cite this

Run-to-run control charts with contrasts. / Runger, George; Fowler, John.

In: Quality and Reliability Engineering International, Vol. 14, No. 4, 08.1998, p. 261-272.

Research output: Contribution to journalArticle

@article{74946bf091d04bfa81f34462dfc6cf77,
title = "Run-to-run control charts with contrasts",
abstract = "In semiconductor manufacturing it is useful to design control charts to be sensitive to anticipated assignable causes. Process knowledge can be used to develop summaries for run-to-run control that are more sensitive to problems than traditional approaches. As the number of measurements recorded from a run increases, appropriate summaries derived from process knowledge become more important. Control charts based on linear contrasts are generated from partitions of a standard analysis of variance model. These contrasts simplify the development and interpretation of charts sensitized for specific assignable causes. The use of EWMA control charts for these statistics is described.",
keywords = "Average run length, Exponentially weighted moving average, Statistical process control",
author = "George Runger and John Fowler",
year = "1998",
month = "8",
language = "English (US)",
volume = "14",
pages = "261--272",
journal = "Quality and Reliability Engineering International",
issn = "0748-8017",
publisher = "John Wiley and Sons Ltd",
number = "4",

}

TY - JOUR

T1 - Run-to-run control charts with contrasts

AU - Runger, George

AU - Fowler, John

PY - 1998/8

Y1 - 1998/8

N2 - In semiconductor manufacturing it is useful to design control charts to be sensitive to anticipated assignable causes. Process knowledge can be used to develop summaries for run-to-run control that are more sensitive to problems than traditional approaches. As the number of measurements recorded from a run increases, appropriate summaries derived from process knowledge become more important. Control charts based on linear contrasts are generated from partitions of a standard analysis of variance model. These contrasts simplify the development and interpretation of charts sensitized for specific assignable causes. The use of EWMA control charts for these statistics is described.

AB - In semiconductor manufacturing it is useful to design control charts to be sensitive to anticipated assignable causes. Process knowledge can be used to develop summaries for run-to-run control that are more sensitive to problems than traditional approaches. As the number of measurements recorded from a run increases, appropriate summaries derived from process knowledge become more important. Control charts based on linear contrasts are generated from partitions of a standard analysis of variance model. These contrasts simplify the development and interpretation of charts sensitized for specific assignable causes. The use of EWMA control charts for these statistics is described.

KW - Average run length

KW - Exponentially weighted moving average

KW - Statistical process control

UR - http://www.scopus.com/inward/record.url?scp=0032117293&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032117293&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0032117293

VL - 14

SP - 261

EP - 272

JO - Quality and Reliability Engineering International

JF - Quality and Reliability Engineering International

SN - 0748-8017

IS - 4

ER -