Abstract
In semiconductor manufacturing it is useful to design control charts to be sensitive to anticipated assignable causes. Process knowledge can be used to develop summaries for run-to-run control that are more sensitive to problems than traditional approaches. As the number of measurements recorded from a run increases, appropriate summaries derived from process knowledge become more important. Control charts based on linear contrasts are generated from partitions of a standard analysis of variance model. These contrasts simplify the development and interpretation of charts sensitized for specific assignable causes. The use of EWMA control charts for these statistics is described.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 261-272 |
| Number of pages | 12 |
| Journal | Quality and Reliability Engineering International |
| Volume | 14 |
| Issue number | 4 |
| DOIs | |
| State | Published - Aug 1998 |
Keywords
- Average run length
- Exponentially weighted moving average
- Statistical process control
ASJC Scopus subject areas
- Safety, Risk, Reliability and Quality
- Management Science and Operations Research