Abstract
The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distribution on the surface, which were determined from AFM scans, varied with scan size and thus were not constant for all surfaces examined. The greatest variation in these parameters occurred with materials that had large asperities or with materials where a large fraction of the surface was covered by asperities. These rough surfaces were modeled with fractals and also with a fast Fourier transform algorithm. When the model surfaces generated using the Fourier transforms are used in the adhesion model, the model accurately predicts the experimentally observed adhesion forces measured with the AFM.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 289-298 |
| Number of pages | 10 |
| Journal | Journal of Colloid and Interface Science |
| Volume | 280 |
| Issue number | 2 |
| DOIs | |
| State | Published - Dec 15 2004 |
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Keywords
- Fourier transform
- Particle adhesion
- Post-CMP cleaning
- Surface roughness
ASJC Scopus subject areas
- Colloid and Surface Chemistry
- Physical and Theoretical Chemistry
- Surfaces and Interfaces
Cite this
Roughness models for particle adhesion. / Eichenlaub, Sean; Gelb, Anne; Beaudoin, Steve.
In: Journal of Colloid and Interface Science, Vol. 280, No. 2, 15.12.2004, p. 289-298.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Roughness models for particle adhesion
AU - Eichenlaub, Sean
AU - Gelb, Anne
AU - Beaudoin, Steve
PY - 2004/12/15
Y1 - 2004/12/15
N2 - The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distribution on the surface, which were determined from AFM scans, varied with scan size and thus were not constant for all surfaces examined. The greatest variation in these parameters occurred with materials that had large asperities or with materials where a large fraction of the surface was covered by asperities. These rough surfaces were modeled with fractals and also with a fast Fourier transform algorithm. When the model surfaces generated using the Fourier transforms are used in the adhesion model, the model accurately predicts the experimentally observed adhesion forces measured with the AFM.
AB - The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distribution on the surface, which were determined from AFM scans, varied with scan size and thus were not constant for all surfaces examined. The greatest variation in these parameters occurred with materials that had large asperities or with materials where a large fraction of the surface was covered by asperities. These rough surfaces were modeled with fractals and also with a fast Fourier transform algorithm. When the model surfaces generated using the Fourier transforms are used in the adhesion model, the model accurately predicts the experimentally observed adhesion forces measured with the AFM.
KW - Fourier transform
KW - Particle adhesion
KW - Post-CMP cleaning
KW - Surface roughness
UR - http://www.scopus.com/inward/record.url?scp=7944236277&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=7944236277&partnerID=8YFLogxK
U2 - 10.1016/j.jcis.2004.08.017
DO - 10.1016/j.jcis.2004.08.017
M3 - Article
C2 - 15533399
AN - SCOPUS:7944236277
VL - 280
SP - 289
EP - 298
JO - Journal of Colloid and Interface Science
JF - Journal of Colloid and Interface Science
SN - 0021-9797
IS - 2
ER -