ROLE OF TRAPPED INTERSTITIALS DURING RAPID THERMAL ANNEALING.

S. J. Pennycook, Robert Culbertson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

14 Citations (Scopus)

Abstract

During the rapid thermal annealing of ion implanted layers, trapped interstitials are responsible for transient enhanced dopant diffusion and the formation of a band of defects at the mean projected ion range. We describe the detailed nature and extent of these effects and show how they can be predicted in practice. Authors present a model which explains why trapping only occurs with group V implantation and describe double implantation experiments which confirm the model and show how the formation of projected range defects can be suppressed.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposia Proceedings
EditorsThomas O. Sedgwick, Thomas E. Seidel, Bor-Yeu Tsaur
Place of PublicationPittsburgh, PA, USA
PublisherMaterials Research Soc
Pages37-48
Number of pages12
Volume52
ISBN (Print)0931837170
StatePublished - 1986
Externally publishedYes

Fingerprint

Rapid thermal annealing
Ions
Defects
Doping (additives)
Experiments

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Pennycook, S. J., & Culbertson, R. (1986). ROLE OF TRAPPED INTERSTITIALS DURING RAPID THERMAL ANNEALING. In T. O. Sedgwick, T. E. Seidel, & B-Y. Tsaur (Eds.), Materials Research Society Symposia Proceedings (Vol. 52, pp. 37-48). Pittsburgh, PA, USA: Materials Research Soc.

ROLE OF TRAPPED INTERSTITIALS DURING RAPID THERMAL ANNEALING. / Pennycook, S. J.; Culbertson, Robert.

Materials Research Society Symposia Proceedings. ed. / Thomas O. Sedgwick; Thomas E. Seidel; Bor-Yeu Tsaur. Vol. 52 Pittsburgh, PA, USA : Materials Research Soc, 1986. p. 37-48.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Pennycook, SJ & Culbertson, R 1986, ROLE OF TRAPPED INTERSTITIALS DURING RAPID THERMAL ANNEALING. in TO Sedgwick, TE Seidel & B-Y Tsaur (eds), Materials Research Society Symposia Proceedings. vol. 52, Materials Research Soc, Pittsburgh, PA, USA, pp. 37-48.
Pennycook SJ, Culbertson R. ROLE OF TRAPPED INTERSTITIALS DURING RAPID THERMAL ANNEALING. In Sedgwick TO, Seidel TE, Tsaur B-Y, editors, Materials Research Society Symposia Proceedings. Vol. 52. Pittsburgh, PA, USA: Materials Research Soc. 1986. p. 37-48
Pennycook, S. J. ; Culbertson, Robert. / ROLE OF TRAPPED INTERSTITIALS DURING RAPID THERMAL ANNEALING. Materials Research Society Symposia Proceedings. editor / Thomas O. Sedgwick ; Thomas E. Seidel ; Bor-Yeu Tsaur. Vol. 52 Pittsburgh, PA, USA : Materials Research Soc, 1986. pp. 37-48
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