Residual stress characterization of Al/SiC nanoscale multilayers using X-ray synchrotron radiation

D. R P Singh, X. Deng, Nikhilesh Chawla, J. Bai, C. Hubbard, G. Tang, Y. L. Shen

Research output: Contribution to journalArticle

15 Scopus citations

Abstract

Nanolayered composites are used in a variety of applications such as wear resistant coatings, thermal barrier coatings, optical and magnetic thin films, and biological coatings. Residual stresses produced in these materials during processing play an important role in controlling their microstructure and properties. In this paper, we have studied the residual stresses in model metal-ceramic Al/SiC nanoscale multilayers produced by physical vapor deposition (magnetron sputtering). X-ray synchrotron radiation was used to measure stresses in the multilayers using the sin2Ψ technique. The stresses were evaluated as a function of layer thicknesses of Al and SiC and also as a function of the number of layers. The stress state of Al in the multilayer was largely compressive, compared to single layer Al stresses. This is attributed to a peening mechanism due to bombardment of the Al layers by SiC and Ar neutrals during deposition. The stress evolution was numerically modeled by a simplified peening process to qualitatively explain the Al thickness-dependent residual stresses.

Original languageEnglish (US)
Pages (from-to)759-765
Number of pages7
JournalThin Solid Films
Volume519
Issue number2
DOIs
StatePublished - Nov 1 2010

Keywords

  • Metal-ceramic multilayers
  • Residual stress
  • X-ray synchrotron

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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