Removal of co-occurring anions (U, Sb, W, V, P, Si, CIO4) during arsenic treatment

Paul Westerhoff, Kiril Hristovski, Troy Benn, Pedram Shafieian

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

As arsenic treatment systems for groundwater are being designed and installed, it is becoming apparent that many co-occurring anions can be present along with arsenic. Geological formations containing arsenic are often enriched with other trace metals, including uranium, antimony, tungsten, vanadium, and silica. With exception of silica, U, Sb, W, and V have all been implicated with various adverse human health effects. New regulations mean that many small utilities still do not know how much uranium is present in their waters. While silica does not pose a health effect, its presence detrimentally impacts arsenic removal by iron adsorbents. Elevated phosphate is less likely to occur in conjunction with elevated arsenic, but we have data from several sites with significant P concentrations. There is also the potential for chemical contaminants (e.g., perchlorate) to occur with arsenic - and systems designed to remove ClO4 - generally do not remove arsenic. Therefore data from multiple groundwaters across the US were studied for simultaneous removal of arsenic and co-occurring anions.

Original languageEnglish (US)
Title of host publicationAmerican Water Works Association - Water Quality Technology Conference and Exposition 2006
Subtitle of host publicationTaking Water Quality to New Heights
Pages3032-3058
Number of pages27
StatePublished - Dec 1 2006
EventWater Quality Technology Conference and Exposition 2006: Taking Water Quality to New Heights - Denver, CO, United States
Duration: Nov 5 2006Nov 9 2006

Publication series

NameAmerican Water Works Association - Water Quality Technology Conference and Exposition 2006: Taking Water Quality to New Heights

Other

OtherWater Quality Technology Conference and Exposition 2006: Taking Water Quality to New Heights
CountryUnited States
CityDenver, CO
Period11/5/0611/9/06

ASJC Scopus subject areas

  • Safety, Risk, Reliability and Quality
  • Water Science and Technology
  • Geography, Planning and Development

Fingerprint Dive into the research topics of 'Removal of co-occurring anions (U, Sb, W, V, P, Si, CIO<sub>4</sub>) during arsenic treatment'. Together they form a unique fingerprint.

  • Cite this

    Westerhoff, P., Hristovski, K., Benn, T., & Shafieian, P. (2006). Removal of co-occurring anions (U, Sb, W, V, P, Si, CIO4) during arsenic treatment. In American Water Works Association - Water Quality Technology Conference and Exposition 2006: Taking Water Quality to New Heights (pp. 3032-3058). (American Water Works Association - Water Quality Technology Conference and Exposition 2006: Taking Water Quality to New Heights).