Removal of carbon monoxide and hydrogen from air

Ravi Kumar, Shuguang Deng

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Ultra high purity N2 is required in the manufacture of integrated circuits to prevent defects in chips of increasing line densities. Cryogenic distillation is typically used for the production of highly purified nitrogen gas. Almost all the H2 and about 2/3rd of CO present in ambient air ends up in nitrogen produced by cryogenic distillation. A discussion on the removal of CO and hydrogen from air covers a two-step procedure employed for the removal of these impurities from air in a nitrogen production process; the order of arrangement for different adsorbent and catalyst layers in such units, and its impact on unit performance; reducing the amount of catalyst required to oxidize hydrogen to moisture; and reasons for this improved performance and its implications. This is an abstract of a paper presented at the AIChE Annual Meeting and Fall Showcase (Cincinnati, OH 10/30/2005-11/4/2005).

Original languageEnglish (US)
Title of host publication05AIChE
Subtitle of host publication2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings
PublisherAmerican Institute of Chemical Engineers
ISBN (Print)0816909962, 9780816909964
StatePublished - Jan 1 2005
Externally publishedYes
Event05AIChE: 2005 AIChE Annual Meeting and Fall Showcase - Cincinnati, OH, United States
Duration: Oct 30 2005Nov 4 2005

Publication series

NameAIChE Annual Meeting Conference Proceedings
Volume2005

Other

Other05AIChE: 2005 AIChE Annual Meeting and Fall Showcase
CountryUnited States
CityCincinnati, OH
Period10/30/0511/4/05

ASJC Scopus subject areas

  • Energy(all)

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