Remediation of cobalt from semiconductor wastewater in the frame of fluidized-bed homogeneous granulation process

Engineering & Materials Science

• Granulation 97%
• Remediation 96%
• Cobalt 87%
• Wastewater 80%
• Fluidized beds 77%
• Semiconductor materials 67%
• Effluents 53%
• Phosphates 43%
• Copper 30%
• Crystal growth 26%
• Heavy metals 24%
• Crystallization 20%
• Recovery 19%
• Metals 18%
• Ethylenediaminetetraacetic acid 14%
• Negative ions 12%
• Chemical mechanical polishing 12%
• Fluidization 11%
• Molar ratio 11%
• Hydrates 10%
• Etching 10%
• Energy dispersive spectroscopy 9%
• Flow velocity 9%
• Minerals 9%
• Crystals 9%
• Cleaning 8%
• Ions 8%
• Acids 8%
• Scanning electron microscopy 7%
• Liquids 6%
• Water 5%
• Industry 4%

Earth & Environmental Sciences

• semiconductor 82%
• cobalt 79%
• remediation 62%
• wastewater 50%
• effluent 33%
• phosphate 29%
• copper 27%
• crystal 19%
• resource 15%
• crystallization 15%
• heavy metal 13%
• semiconductor industry 13%
• fluidization 10%
• process water 10%
• etching 10%
• EDTA 10%
• removal 10%
• coexistence 9%
• anion 8%
• flow velocity 8%
• collision 8%
• manufacturing 7%
• X-ray diffraction 7%
• scanning electron microscopy 6%
• reactor 6%
• ion 6%
• acid 5%
• policy 5%
• liquid 5%
• pollutant 5%
• mineral 5%
• particle 4%
• chemical 4%
• parameter 3%

Chemical Compounds

• Granulation 100%
• Fluidized Bed 92%
• Remediation 78%
• Wastewater 60%
• Semiconductor 57%
• Wastewater Polishing 19%
• Phosphate 18%
• Crystal Growth 18%
• Heavy Metal 15%
• Crystallization 13%
• Fluidization 13%
• pH Value 12%
• Inorganic Anion 11%
• Collision 9%
• Hydrate 8%
• Etching 8%
• Metal 8%
• Velocity 7%
• Environmental Pollutant 7%
• Mineral 7%
• Industry 6%
• Green 6%
• Flow 6%
• Ion 3%
• Acid 3%