Recovery in dc performance of off-state step-stressed AlGaN/GaN high electron mobility transistor with thermal annealing

Byung Jae Kim, Shihyun Ahn, Tsung Sheng Kang, Junhao Zhu, Fan Ren, Stephen J. Pearton, David Smith

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The effects of thermal annealing on dc performance of off-state drain-voltage step-stressed AlGaN/GaN high electron mobility transistors were investigated. Degradations of increasing reverse-biased gate leakage current and sub-threshold swing, as well as reducing saturating drain current and drain current on-off ratio were observed after reaching a critical voltage during the step-stressing. Interestingly, the degradations of dc performance for the stressed HEMT were recovered after a thermal annealing at 450°C for 10 mins. HEMT integrated with an on-chip trapezoid-shape heater was proposed to realize a self-healing device.

Original languageEnglish (US)
Title of host publicationCS MANTECH 2016 - International Conference on Compound Semiconductor Manufacturing Technology
PublisherCS Mantech
Pages271-273
Number of pages3
StatePublished - 2016
Event31st Annual International Conference on Compound Semiconductor Manufacturing Technology, CS ManTech 2016 - Miami, United States
Duration: May 16 2016May 19 2016

Other

Other31st Annual International Conference on Compound Semiconductor Manufacturing Technology, CS ManTech 2016
Country/TerritoryUnited States
CityMiami
Period5/16/165/19/16

Keywords

  • HEMT
  • Off-state step-stress
  • Self-healing device
  • Thermal annealing
  • Thermal simulation

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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