Recent studies of thin films and surfaces by high-Resolution electron microscopy

David Smith, Rob W. Glaisher, Z. G. Li, Ping Lu, Martha McCartney, S. C Y Tsen, A. K. Datye

Research output: Contribution to journalArticle

Abstract

The technique of high-resolution electron microscopy represents a powerful method for characterizing the microstructure of thin films and surfaces. We demonstrate its usefulness by reference to some recent studies of metals, semiconductors, and oxides, in particular, showing that it can be used to follow physical and chemical changes induced in situ by the electron beam or ex situ as a result of annealing or chemical treatment.

Original languageEnglish (US)
Pages (from-to)1063-1070
Number of pages8
JournalMetallurgical Transactions A
Volume23
Issue number4
DOIs
StatePublished - Apr 1992

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High resolution electron microscopy
Oxides
Electron beams
electron microscopy
Metals
electron beams
Annealing
Semiconductor materials
Thin films
microstructure
Microstructure
annealing
oxides
high resolution
thin films
metals

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Metals and Alloys
  • Mechanics of Materials

Cite this

Recent studies of thin films and surfaces by high-Resolution electron microscopy. / Smith, David; Glaisher, Rob W.; Li, Z. G.; Lu, Ping; McCartney, Martha; Tsen, S. C Y; Datye, A. K.

In: Metallurgical Transactions A, Vol. 23, No. 4, 04.1992, p. 1063-1070.

Research output: Contribution to journalArticle

Smith, David ; Glaisher, Rob W. ; Li, Z. G. ; Lu, Ping ; McCartney, Martha ; Tsen, S. C Y ; Datye, A. K. / Recent studies of thin films and surfaces by high-Resolution electron microscopy. In: Metallurgical Transactions A. 1992 ; Vol. 23, No. 4. pp. 1063-1070.
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