Recent studies of thin films and surfaces by high-Resolution electron microscopy

David Smith, Rob W. Glaisher, Z. G. Li, Ping Lu, Martha McCartney, S. C Y Tsen, A. K. Datye

Research output: Contribution to journalArticlepeer-review

Abstract

The technique of high-resolution electron microscopy represents a powerful method for characterizing the microstructure of thin films and surfaces. We demonstrate its usefulness by reference to some recent studies of metals, semiconductors, and oxides, in particular, showing that it can be used to follow physical and chemical changes induced in situ by the electron beam or ex situ as a result of annealing or chemical treatment.

Original languageEnglish (US)
Pages (from-to)1063-1070
Number of pages8
JournalMetallurgical Transactions A
Volume23
Issue number4
DOIs
StatePublished - Apr 1 1992

ASJC Scopus subject areas

  • Engineering(all)

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