Reactive ion etching surface texturing of c-Si using silica nanosphere lithography technique for solar cell application

Jea Young Choi, Christiana Honsberg

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

A reactive ion etching (RIE) process has been applied to etch diverse shape of nanoscale surface texturing on crystalline silicon (c-Si) for solar cell application. In this work, silica nanospheres (NS) were used as a mask material to utilize selective etching between silicon surface and silica NS for texturing. For effective silica NS deposition, we also developed our own solvent-control spin-coating method showing great monolayer coverage under common laboratory environment which is possibly more suitable for low-cost fabrication compared to conventional approach (moisture and temperature controlled spin-coating or dipping coating method by Langmuir-Blodgett trough). In RIE process, the surface texturing was etched with various shapes to reduce the reflectivity from surface, and the spectral response measurement confirms the effectiveness of RIE texturing which showed phenomenal anti-reflection effect with less than 2% of light reflection below 1.0 um wavelength. In addition, experiments for Quinhydrone/Methanol (QHY/ME) surface passivation for RIE textured surface were proceeded to evaluate RIE texturing effect for surface recombination velocity and minority carrier lifetime.

Original languageEnglish (US)
Title of host publicationConference Record of the IEEE Photovoltaic Specialists Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1199-1202
Number of pages4
ISBN (Print)9781479932993
DOIs
StatePublished - 2013
Event39th IEEE Photovoltaic Specialists Conference, PVSC 2013 - Tampa, FL, United States
Duration: Jun 16 2013Jun 21 2013

Other

Other39th IEEE Photovoltaic Specialists Conference, PVSC 2013
CountryUnited States
CityTampa, FL
Period6/16/136/21/13

Fingerprint

Texturing
Nanospheres
Reactive ion etching
Lithography
Solar cells
Silica
Crystalline materials
Silicon
Spin coating
Light reflection
Carrier lifetime
Passivation
Masks
Etching
Monolayers
Methanol
Moisture
Fabrication
Coatings
Wavelength

Keywords

  • Mono-crystalline silicon
  • Reactive ion etching
  • Silica nanospheres
  • Surface passivation
  • Surface texturing

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering

Cite this

Choi, J. Y., & Honsberg, C. (2013). Reactive ion etching surface texturing of c-Si using silica nanosphere lithography technique for solar cell application. In Conference Record of the IEEE Photovoltaic Specialists Conference (pp. 1199-1202). [6744355] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PVSC.2013.6744355

Reactive ion etching surface texturing of c-Si using silica nanosphere lithography technique for solar cell application. / Choi, Jea Young; Honsberg, Christiana.

Conference Record of the IEEE Photovoltaic Specialists Conference. Institute of Electrical and Electronics Engineers Inc., 2013. p. 1199-1202 6744355.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Choi, JY & Honsberg, C 2013, Reactive ion etching surface texturing of c-Si using silica nanosphere lithography technique for solar cell application. in Conference Record of the IEEE Photovoltaic Specialists Conference., 6744355, Institute of Electrical and Electronics Engineers Inc., pp. 1199-1202, 39th IEEE Photovoltaic Specialists Conference, PVSC 2013, Tampa, FL, United States, 6/16/13. https://doi.org/10.1109/PVSC.2013.6744355
Choi JY, Honsberg C. Reactive ion etching surface texturing of c-Si using silica nanosphere lithography technique for solar cell application. In Conference Record of the IEEE Photovoltaic Specialists Conference. Institute of Electrical and Electronics Engineers Inc. 2013. p. 1199-1202. 6744355 https://doi.org/10.1109/PVSC.2013.6744355
Choi, Jea Young ; Honsberg, Christiana. / Reactive ion etching surface texturing of c-Si using silica nanosphere lithography technique for solar cell application. Conference Record of the IEEE Photovoltaic Specialists Conference. Institute of Electrical and Electronics Engineers Inc., 2013. pp. 1199-1202
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