Reactive ion etching surface texturing of c-Si using silica nanosphere lithography technique for solar cell application

Jea Young Choi, Christiana Honsberg

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

A reactive ion etching (RIE) process has been applied to etch diverse shape of nanoscale surface texturing on crystalline silicon (c-Si) for solar cell application. In this work, silica nanospheres (NS) were used as a mask material to utilize selective etching between silicon surface and silica NS for texturing. For effective silica NS deposition, we also developed our own solvent-control spin-coating method showing great monolayer coverage under common laboratory environment which is possibly more suitable for low-cost fabrication compared to conventional approach (moisture and temperature controlled spin-coating or dipping coating method by Langmuir-Blodgett trough). In RIE process, the surface texturing was etched with various shapes to reduce the reflectivity from surface, and the spectral response measurement confirms the effectiveness of RIE texturing which showed phenomenal anti-reflection effect with less than 2% of light reflection below 1.0 um wavelength. In addition, experiments for Quinhydrone/Methanol (QHY/ME) surface passivation for RIE textured surface were proceeded to evaluate RIE texturing effect for surface recombination velocity and minority carrier lifetime.

Original languageEnglish (US)
Title of host publication39th IEEE Photovoltaic Specialists Conference, PVSC 2013
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1199-1202
Number of pages4
ISBN (Print)9781479932993
DOIs
StatePublished - Jan 1 2013
Event39th IEEE Photovoltaic Specialists Conference, PVSC 2013 - Tampa, FL, United States
Duration: Jun 16 2013Jun 21 2013

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
ISSN (Print)0160-8371

Other

Other39th IEEE Photovoltaic Specialists Conference, PVSC 2013
CountryUnited States
CityTampa, FL
Period6/16/136/21/13

Keywords

  • Mono-crystalline silicon
  • Reactive ion etching
  • Silica nanospheres
  • Surface passivation
  • Surface texturing

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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    Choi, J. Y., & Honsberg, C. (2013). Reactive ion etching surface texturing of c-Si using silica nanosphere lithography technique for solar cell application. In 39th IEEE Photovoltaic Specialists Conference, PVSC 2013 (pp. 1199-1202). [6744355] (Conference Record of the IEEE Photovoltaic Specialists Conference). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PVSC.2013.6744355