Abstract
The Raman spectrum of nearly relaxed Ge1-ySny alloys grown on Si substrates was investigated for Sn concentrations y < 0.2. The frequency dependence of the Ge-Ge Raman mode was re-evaluated by carrying out careful corrections for residual strain shifts. The Ge-Sn mode was observed for the first time in this type of samples. Its frequency appears to decrease monotonically as a function of the Sn concentration. This is very different from the behavior of the Si-Ge mode in Si1-yGey alloys, but a detailed analysis suggest that there is a scaling relationship between these modes that is the analog of the scaling relationship found earlier for the Ge-Ge mode. Raman activity is also found in the spectral range where Sn-Sn modes are expected, but the polarization properties of these features suggest an overlap with disorder-activated Ge-acoustic phonons. Additional features observed in "forbidden" scattering configurations are also assigned to disorder-activated Raman scattering.
Original language | English (US) |
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Pages (from-to) | 240-244 |
Number of pages | 5 |
Journal | Solid State Communications |
Volume | 144 |
Issue number | 5-6 |
DOIs | |
State | Published - Nov 1 2007 |
Keywords
- A. Semiconductors
- D. Raman scattering
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Materials Chemistry