A new approach to quantitative analysis of major element levels by secondary ion mass spectrometry is reported. A minor isotope of the element of interest is implanted directly into the analytical sample to be utilized as a standard. This approach has been used for analysis of hydrogen in amorphous silicon. The hydrogen content determined by reference to the implanted deuterium standard was compared to a nuclear reaction analysis of the same sample; the results agreed within the combined uncertainties of the measurements (10%). Isotope fractionation in the ion ejection process was determined by analysis of a silicon sample implanted with the species HD+.
|Original language||English (US)|
|Number of pages||4|
|Journal||Nuclear Instruments and Methods In Physics Research|
|State||Published - Dec 15 1983|
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