Quantitative fundamental SIMS studies using 18 O implant standards

Peter Williams, Richard C. Sobers, Klaus Franzreb, Jan Lörinčík

Research output: Contribution to journalArticle

11 Scopus citations

Abstract

The use of dilute 'minor-isotope' 18 O implant reference standards for quantification of surface oxygen levels during steady-state SIMS depth profiling is demonstrated. Some results of two types of quantitative fundamental SIMS studies with oxygen ( 16 O) primary ion bombardment and/or oxygen flooding (O 2 gas with natural isotopic abundance) are presented: (1) Determination of elemental useful ion yields, UY(X ± ), and sample sputter yields, Y, as a function of the oxygen fraction c O measured in the total flux emitted from the sputtered surface. Examples include new results for positive secondary ion emission of several elements (X = B, C, O, Al, Si, Cu, Ga, Ge, Cs) from variably oxidized SiC or Ge surfaces. (2) The dependence of exponential decay lengths λ(Au ± ) in sputter depth profiles of gold overlayers on silicon on the amount of oxygen present at the sputtered silicon surface. The latter study elucidates the (element-specific) effects of oxygen-induced surface segregation artifacts for sputter depth profiling through metal overlayers into silicon substrates.

Original languageEnglish (US)
Pages (from-to)6429-6432
Number of pages4
JournalApplied Surface Science
Volume252
Issue number19
DOIs
StatePublished - Jul 30 2006

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Keywords

  • Implant standard
  • Oxygen
  • Segregation
  • Sputter yield
  • Useful ion yield

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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