Quantitative analysis of interfacial impurities using secondary-ion mass spectrometry

Peter Williams, Judith E. Baker

Research output: Contribution to journalArticle

37 Citations (Scopus)

Abstract

A new secondary-ion mass spectrometry technique is described which permits quantitative analysis of impurities at buried interfaces. The technique utilizes the cascade mixing which accompanies sputtering to mix, and dilute, interfacial impurities into the surrounding matrix to such an extent that ion yields through the interface region are constant and characteristic of the matrix. Comparison with ion-implanted standards then yields analyses accurate to better than 30% (limited by knowledge of the standards) with a statistical uncertainty of 2%.

Original languageEnglish (US)
Pages (from-to)842-845
Number of pages4
JournalApplied Physics Letters
Volume36
Issue number10
DOIs
StatePublished - 1980
Externally publishedYes

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secondary ion mass spectrometry
quantitative analysis
impurities
matrices
cascades
ions
sputtering

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Quantitative analysis of interfacial impurities using secondary-ion mass spectrometry. / Williams, Peter; Baker, Judith E.

In: Applied Physics Letters, Vol. 36, No. 10, 1980, p. 842-845.

Research output: Contribution to journalArticle

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