Quantitative analysis of 1D ultra-shallow junctions using off-axis electron holography

Martha McCartney, M. G. Han, Jing Li, Peter Fejes, Qianghua Xie, Gordon Tam, Sandeep Bagchi, Bill Taylor, James Conner

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

The ability to carefully engineer ultra-shallow junctions close to the gate is critical for high performance advanced CMOS devices. Electron holography (EH) has been proposed and investigated as one of the promising techniques for mapping dopant profiles at a nanometer scale in two-dimension (2D). We have developed a low-damage and reproducible sample preparation technique (based on polishing) to prepare samples suitable for EH imaging. Accurate measurements of electro-static potentials across ultra-shallow junctions (both N and P type) by EH have been obtained. Potential profiles derived from ultra-shallow junctions (in the range of 10-30 nm) closely match simulated profiles calculated from secondary ion mass spectroscopy (SIMS) doping profiles of the same junctions. This sets a good baseline for extending the application of electron holography to the quantitative mapping of 2D dopant profiles at close to nanometer spatial resolution.

Original languageEnglish (US)
Title of host publicationCHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2005 - International Conference
Pages565-568
Number of pages4
DOIs
StatePublished - Sep 9 2005
Event2005 International Conference on Characterization and Metrology for ULSI Technology - Richardson, TX, United States
Duration: Mar 15 2005Mar 18 2005

Publication series

NameAIP Conference Proceedings
Volume788
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Other

Other2005 International Conference on Characterization and Metrology for ULSI Technology
CountryUnited States
CityRichardson, TX
Period3/15/053/18/05

Keywords

  • Dopant profiles
  • Electron holography
  • Ultra-shallow junctions

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Quantitative analysis of 1D ultra-shallow junctions using off-axis electron holography'. Together they form a unique fingerprint.

  • Cite this

    McCartney, M., Han, M. G., Li, J., Fejes, P., Xie, Q., Tam, G., Bagchi, S., Taylor, B., & Conner, J. (2005). Quantitative analysis of 1D ultra-shallow junctions using off-axis electron holography. In CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2005 - International Conference (pp. 565-568). (AIP Conference Proceedings; Vol. 788). https://doi.org/10.1063/1.2063019