Properties of platinum films by liquid-source MOCVD in H 2 and O 2

J. Goswami, P. Majhi, C. G. Wang, Sandwip Dey

Research output: Chapter in Book/Report/Conference proceedingChapter

11 Scopus citations

Abstract

A preliminary evaluation of Pt films, deposited at rates of 0.4-7 nm/min by a potentially manufacturable liquid-source MOCVD technique, was carried out with respect to microstructure, step coverage, and electrical properties. The Pt films (12-140 nm) were deposited on various substrates (thermal-SiO 2/Si, native-oxide/Si, TiN/SiO 2/Si) via the pyrolysis of trimethyl methyl cyclopentadienyl platinum [(CH 3) 3CH 3CpPt]. The substrate temperature regimes through which Pt deposition occurred, were 175-250°C and 300-450°C in H 2 and O 2 ambient, respectively. The growth mechanisms of the Pt films, deposited under H 2 and O 2 ambient, were inferred from the observed growth rate, texture evolution, grain size, and estimated nucleation density. Additionally, the step-coverage of Pt deposited on TiN at T sub of 375°C in O 2 was 80%. Moreover, the resistivity of a 30 nm Pt film was 22.8 μΩcm.

Original languageEnglish (US)
Title of host publicationIntegrated Ferroelectrics
Pages13-23
Number of pages11
Volume42
DOIs
StatePublished - 2002

Keywords

  • Liquid-source
  • Metalorganic
  • MOCVD
  • Platinum
  • Thin film

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

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    Goswami, J., Majhi, P., Wang, C. G., & Dey, S. (2002). Properties of platinum films by liquid-source MOCVD in H 2 and O 2 In Integrated Ferroelectrics (Vol. 42, pp. 13-23) https://doi.org/10.1080/10584580210869