Progress towards quantitative high-resolution electron microscopy

David Smith; W. J. de Ruijter; Martha McCartney; J. K. Weiss

doi:10.1016/0304-3991(93)90078-C

Progress towards quantitative high-resolution electron microscopy

David Smith, W. J. de Ruijter, Martha McCartney, J. K. Weiss

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

In recent years there has been a great upsurge of applications involving quantitative high-resolution electron microscopy, in particular comparing experimental micrographs with image simulations for determination of defect structures. Emphasis has been given to the determination of experimental parameters, the utilization of slow-scan CCD cameras for digital recording and extraction of quantitative structural and chemical information. More attention to surface cleanliness is needed to improve signal quality and the possibility of electron irradiation damage should not be overlooked. Issues related to adoption of a reliability of R-factor are briefly discussed.

Original language	English (US)
Pages (from-to)	591-601
Number of pages	11
Journal	Ultramicroscopy
Volume	52
Issue number	3-4
DOIs	https://doi.org/10.1016/0304-3991(93)90078-C
State	Published - Dec 1993

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Instrumentation

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10.1016/0304-3991(93)90078-C

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@article{ead3111dc51d449cba648e3f8b79cd79,

title = "Progress towards quantitative high-resolution electron microscopy",

abstract = "In recent years there has been a great upsurge of applications involving quantitative high-resolution electron microscopy, in particular comparing experimental micrographs with image simulations for determination of defect structures. Emphasis has been given to the determination of experimental parameters, the utilization of slow-scan CCD cameras for digital recording and extraction of quantitative structural and chemical information. More attention to surface cleanliness is needed to improve signal quality and the possibility of electron irradiation damage should not be overlooked. Issues related to adoption of a reliability of R-factor are briefly discussed.",

author = "David Smith and {de Ruijter}, {W. J.} and Martha McCartney and Weiss, {J. K.}",

note = "Funding Information: Our experimental work was conducted at the Center for High Resolution Electron Microscopy at Arizona State University supported by NSF Grants DMR-89-15584 and DMR-91-15680. D.J.S. gratefully acknowledges discussions with Drs. U. Dahmen and M.A. O'Keefe.",

year = "1993",

month = dec,

doi = "10.1016/0304-3991(93)90078-C",

language = "English (US)",

volume = "52",

pages = "591--601",

journal = "Ultramicroscopy",

issn = "0304-3991",

publisher = "Elsevier",

number = "3-4",

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TY - JOUR

T1 - Progress towards quantitative high-resolution electron microscopy

AU - Smith, David

AU - de Ruijter, W. J.

AU - McCartney, Martha

AU - Weiss, J. K.

N1 - Funding Information: Our experimental work was conducted at the Center for High Resolution Electron Microscopy at Arizona State University supported by NSF Grants DMR-89-15584 and DMR-91-15680. D.J.S. gratefully acknowledges discussions with Drs. U. Dahmen and M.A. O'Keefe.

PY - 1993/12

Y1 - 1993/12

N2 - In recent years there has been a great upsurge of applications involving quantitative high-resolution electron microscopy, in particular comparing experimental micrographs with image simulations for determination of defect structures. Emphasis has been given to the determination of experimental parameters, the utilization of slow-scan CCD cameras for digital recording and extraction of quantitative structural and chemical information. More attention to surface cleanliness is needed to improve signal quality and the possibility of electron irradiation damage should not be overlooked. Issues related to adoption of a reliability of R-factor are briefly discussed.

AB - In recent years there has been a great upsurge of applications involving quantitative high-resolution electron microscopy, in particular comparing experimental micrographs with image simulations for determination of defect structures. Emphasis has been given to the determination of experimental parameters, the utilization of slow-scan CCD cameras for digital recording and extraction of quantitative structural and chemical information. More attention to surface cleanliness is needed to improve signal quality and the possibility of electron irradiation damage should not be overlooked. Issues related to adoption of a reliability of R-factor are briefly discussed.

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U2 - 10.1016/0304-3991(93)90078-C

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JO - Ultramicroscopy

JF - Ultramicroscopy

IS - 3-4

ER -

Progress towards quantitative high-resolution electron microscopy

Abstract

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