Printing of sub-20 nm wide graphene ribbon arrays using nanoimprinted graphite stamps and electrostatic force assisted bonding

Chao Wang, Keith J. Morton, Zengli Fu, Wen Di Li, Stephen Y. Chou

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

Nano-graphene ribbons are promising in many electronic applications, as their bandgaps can be opened by reducing the widths, e.g.below 20nm. However, a high-throughput method to pattern large-area nano-graphene features is still not available. Here we report a fabrication method of sub-20nm ribbons on graphite stamps by nanoimprint lithography and a transfer-printing of the graphene ribbons to a Si wafer using electrostatic force assisted bonding. These methods provide a path for fast and high-throughput nano-graphene device production.

Original languageEnglish (US)
Article number445301
JournalNanotechnology
Volume22
Issue number44
DOIs
StatePublished - Nov 4 2011
Externally publishedYes

Fingerprint

Graphite
Electrostatic force
Graphene
Printing
Throughput
Nanoimprint lithography
Energy gap
Fabrication

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Electrical and Electronic Engineering
  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Science(all)

Cite this

Printing of sub-20 nm wide graphene ribbon arrays using nanoimprinted graphite stamps and electrostatic force assisted bonding. / Wang, Chao; Morton, Keith J.; Fu, Zengli; Li, Wen Di; Chou, Stephen Y.

In: Nanotechnology, Vol. 22, No. 44, 445301, 04.11.2011.

Research output: Contribution to journalArticle

@article{cf53e81bc7fc4beea06236f224a7b10a,
title = "Printing of sub-20 nm wide graphene ribbon arrays using nanoimprinted graphite stamps and electrostatic force assisted bonding",
abstract = "Nano-graphene ribbons are promising in many electronic applications, as their bandgaps can be opened by reducing the widths, e.g.below 20nm. However, a high-throughput method to pattern large-area nano-graphene features is still not available. Here we report a fabrication method of sub-20nm ribbons on graphite stamps by nanoimprint lithography and a transfer-printing of the graphene ribbons to a Si wafer using electrostatic force assisted bonding. These methods provide a path for fast and high-throughput nano-graphene device production.",
author = "Chao Wang and Morton, {Keith J.} and Zengli Fu and Li, {Wen Di} and Chou, {Stephen Y.}",
year = "2011",
month = "11",
day = "4",
doi = "10.1088/0957-4484/22/44/445301",
language = "English (US)",
volume = "22",
journal = "Nanotechnology",
issn = "0957-4484",
publisher = "IOP Publishing Ltd.",
number = "44",

}

TY - JOUR

T1 - Printing of sub-20 nm wide graphene ribbon arrays using nanoimprinted graphite stamps and electrostatic force assisted bonding

AU - Wang, Chao

AU - Morton, Keith J.

AU - Fu, Zengli

AU - Li, Wen Di

AU - Chou, Stephen Y.

PY - 2011/11/4

Y1 - 2011/11/4

N2 - Nano-graphene ribbons are promising in many electronic applications, as their bandgaps can be opened by reducing the widths, e.g.below 20nm. However, a high-throughput method to pattern large-area nano-graphene features is still not available. Here we report a fabrication method of sub-20nm ribbons on graphite stamps by nanoimprint lithography and a transfer-printing of the graphene ribbons to a Si wafer using electrostatic force assisted bonding. These methods provide a path for fast and high-throughput nano-graphene device production.

AB - Nano-graphene ribbons are promising in many electronic applications, as their bandgaps can be opened by reducing the widths, e.g.below 20nm. However, a high-throughput method to pattern large-area nano-graphene features is still not available. Here we report a fabrication method of sub-20nm ribbons on graphite stamps by nanoimprint lithography and a transfer-printing of the graphene ribbons to a Si wafer using electrostatic force assisted bonding. These methods provide a path for fast and high-throughput nano-graphene device production.

UR - http://www.scopus.com/inward/record.url?scp=80054884172&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=80054884172&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/22/44/445301

DO - 10.1088/0957-4484/22/44/445301

M3 - Article

C2 - 21975519

AN - SCOPUS:80054884172

VL - 22

JO - Nanotechnology

JF - Nanotechnology

SN - 0957-4484

IS - 44

M1 - 445301

ER -