Abstract
Nano-graphene ribbons are promising in many electronic applications, as their bandgaps can be opened by reducing the widths, e.g.below 20nm. However, a high-throughput method to pattern large-area nano-graphene features is still not available. Here we report a fabrication method of sub-20nm ribbons on graphite stamps by nanoimprint lithography and a transfer-printing of the graphene ribbons to a Si wafer using electrostatic force assisted bonding. These methods provide a path for fast and high-throughput nano-graphene device production.
| Original language | English (US) |
|---|---|
| Article number | 445301 |
| Journal | Nanotechnology |
| Volume | 22 |
| Issue number | 44 |
| DOIs | |
| State | Published - Nov 4 2011 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Bioengineering
- Chemistry(all)
- Electrical and Electronic Engineering
- Mechanical Engineering
- Mechanics of Materials
- Materials Science(all)
Cite this
Printing of sub-20 nm wide graphene ribbon arrays using nanoimprinted graphite stamps and electrostatic force assisted bonding. / Wang, Chao; Morton, Keith J.; Fu, Zengli; Li, Wen Di; Chou, Stephen Y.
In: Nanotechnology, Vol. 22, No. 44, 445301, 04.11.2011.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Printing of sub-20 nm wide graphene ribbon arrays using nanoimprinted graphite stamps and electrostatic force assisted bonding
AU - Wang, Chao
AU - Morton, Keith J.
AU - Fu, Zengli
AU - Li, Wen Di
AU - Chou, Stephen Y.
PY - 2011/11/4
Y1 - 2011/11/4
N2 - Nano-graphene ribbons are promising in many electronic applications, as their bandgaps can be opened by reducing the widths, e.g.below 20nm. However, a high-throughput method to pattern large-area nano-graphene features is still not available. Here we report a fabrication method of sub-20nm ribbons on graphite stamps by nanoimprint lithography and a transfer-printing of the graphene ribbons to a Si wafer using electrostatic force assisted bonding. These methods provide a path for fast and high-throughput nano-graphene device production.
AB - Nano-graphene ribbons are promising in many electronic applications, as their bandgaps can be opened by reducing the widths, e.g.below 20nm. However, a high-throughput method to pattern large-area nano-graphene features is still not available. Here we report a fabrication method of sub-20nm ribbons on graphite stamps by nanoimprint lithography and a transfer-printing of the graphene ribbons to a Si wafer using electrostatic force assisted bonding. These methods provide a path for fast and high-throughput nano-graphene device production.
UR - http://www.scopus.com/inward/record.url?scp=80054884172&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=80054884172&partnerID=8YFLogxK
U2 - 10.1088/0957-4484/22/44/445301
DO - 10.1088/0957-4484/22/44/445301
M3 - Article
C2 - 21975519
AN - SCOPUS:80054884172
VL - 22
JO - Nanotechnology
JF - Nanotechnology
SN - 0957-4484
IS - 44
M1 - 445301
ER -