Abstract
Nano-graphene ribbons are promising in many electronic applications, as their bandgaps can be opened by reducing the widths, e.g.below 20nm. However, a high-throughput method to pattern large-area nano-graphene features is still not available. Here we report a fabrication method of sub-20nm ribbons on graphite stamps by nanoimprint lithography and a transfer-printing of the graphene ribbons to a Si wafer using electrostatic force assisted bonding. These methods provide a path for fast and high-throughput nano-graphene device production.
| Original language | English (US) |
|---|---|
| Article number | 445301 |
| Journal | Nanotechnology |
| Volume | 22 |
| Issue number | 44 |
| DOIs | |
| State | Published - Nov 4 2011 |
| Externally published | Yes |
ASJC Scopus subject areas
- Bioengineering
- Chemistry(all)
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering
- Electrical and Electronic Engineering
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Cite this
Wang, C., Morton, K. J., Fu, Z., Li, W. D., & Chou, S. Y. (2011). Printing of sub-20 nm wide graphene ribbon arrays using nanoimprinted graphite stamps and electrostatic force assisted bonding. Nanotechnology, 22(44), [445301]. https://doi.org/10.1088/0957-4484/22/44/445301