Precise control of atomic nitrogen production in an electron cyclotron resonance plasma using N2/noble gas mixtures

Z. Y. Fan, N. Newman

Research output: Contribution to journalArticle

24 Scopus citations

Abstract

The atomic nitrogen flux and impacting ion kinetic energy are two important parameters which influence the quality of deposited nitride films using reactive growth. In this letter, a method is described to control the flux and kinetic energy of atomic and molecular nitrogen ions using an electron cyclotron resonance plasma with N2/Ar and N2/Ne gas mixtures. The results clearly show that the addition of neon to nitrogen plasma can remarkably enhance the production rate of atomic nitrogen due to Penning ionization involving the metastable state of Ne. In contrast, the addition of argon significantly decreases the rate.

Original languageEnglish (US)
Pages (from-to)456-458
Number of pages3
JournalApplied Physics Letters
Volume73
Issue number4
DOIs
StatePublished - Dec 1 1998
Externally publishedYes

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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