Polarization-dependent electron affinity of LiNbO 3 surfaces

W. C. Yang; B. J. Rodriguez; A. Gruverman; R. J. Nemanich

doi:10.1063/1.1790604

Polarization-dependent electron affinity of LiNbO ₃ surfaces

W. C. Yang, B. J. Rodriguez, A. Gruverman, R. J. Nemanich

Research output: Contribution to journal › Article › peer-review

119 Scopus citations

Abstract

The use of ultra-violet photoelectron emission microscopy (PEEM) to image the polarization-dependent electron affinity of LiNbO ₃ surfaces was analyzed. Investigations show polarity contrast between the positive and negative domains. The photon-energy-dependent contrast in the PEEM images of the surface leads to the photothreshold of negative domains. It was concluded that the threshold difference between the opposite domains lead to the variation of electron effinity induced by surface adsorbates.

Original language	English (US)
Pages (from-to)	2316-2318
Number of pages	3
Journal	Applied Physics Letters
Volume	85
Issue number	12
DOIs	https://doi.org/10.1063/1.1790604
State	Published - Sep 20 2004
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.1790604

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title = "Polarization-dependent electron affinity of LiNbO 3 surfaces",

abstract = "The use of ultra-violet photoelectron emission microscopy (PEEM) to image the polarization-dependent electron affinity of LiNbO 3 surfaces was analyzed. Investigations show polarity contrast between the positive and negative domains. The photon-energy-dependent contrast in the PEEM images of the surface leads to the photothreshold of negative domains. It was concluded that the threshold difference between the opposite domains lead to the variation of electron effinity induced by surface adsorbates.",

author = "Yang, {W. C.} and Rodriguez, {B. J.} and A. Gruverman and Nemanich, {R. J.}",

note = "Funding Information: The authors gratefully acknowledge the Duke Free Electron Laser Laboratory for access to the OK-4 free electron laser. Useful discussion with Professor G. Rosenman is gratefully acknowledged. This work was supported by grants through the MFEL program administered through the AFOSR, the Office of Naval Research MURI on Polarization Electronics Contract No. N00014-99-1-0729, and the NSF under Grant No. DMR 0235632.",

year = "2004",

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doi = "10.1063/1.1790604",

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T1 - Polarization-dependent electron affinity of LiNbO 3 surfaces

AU - Yang, W. C.

AU - Rodriguez, B. J.

AU - Gruverman, A.

AU - Nemanich, R. J.

N1 - Funding Information: The authors gratefully acknowledge the Duke Free Electron Laser Laboratory for access to the OK-4 free electron laser. Useful discussion with Professor G. Rosenman is gratefully acknowledged. This work was supported by grants through the MFEL program administered through the AFOSR, the Office of Naval Research MURI on Polarization Electronics Contract No. N00014-99-1-0729, and the NSF under Grant No. DMR 0235632.

PY - 2004/9/20

Y1 - 2004/9/20

N2 - The use of ultra-violet photoelectron emission microscopy (PEEM) to image the polarization-dependent electron affinity of LiNbO 3 surfaces was analyzed. Investigations show polarity contrast between the positive and negative domains. The photon-energy-dependent contrast in the PEEM images of the surface leads to the photothreshold of negative domains. It was concluded that the threshold difference between the opposite domains lead to the variation of electron effinity induced by surface adsorbates.

AB - The use of ultra-violet photoelectron emission microscopy (PEEM) to image the polarization-dependent electron affinity of LiNbO 3 surfaces was analyzed. Investigations show polarity contrast between the positive and negative domains. The photon-energy-dependent contrast in the PEEM images of the surface leads to the photothreshold of negative domains. It was concluded that the threshold difference between the opposite domains lead to the variation of electron effinity induced by surface adsorbates.

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Polarization-dependent electron affinity of LiNbO ₃ surfaces

Abstract

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