Plasmons in amorphous multilayer films

Peter Rez, X. Weng, N. J. Long, A. K. Petford-Long

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

We show, with use of a field-emission scanning transmission electron microscope, changes in the plasmon region from thin films of silicon in a cobalt matrix. These effects are consistent with the dielectric-response theory developed by Howie.

Original languageEnglish (US)
Pages (from-to)9182-9184
Number of pages3
JournalPhysical Review B
Volume42
Issue number14
DOIs
StatePublished - 1990

Fingerprint

Plasmons
Multilayer films
Silicon
Amorphous films
Cobalt
plasmons
Field emission
field emission
Electron microscopes
cobalt
electron microscopes
Scanning
Thin films
scanning
silicon
matrices
thin films

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Rez, P., Weng, X., Long, N. J., & Petford-Long, A. K. (1990). Plasmons in amorphous multilayer films. Physical Review B, 42(14), 9182-9184. https://doi.org/10.1103/PhysRevB.42.9182

Plasmons in amorphous multilayer films. / Rez, Peter; Weng, X.; Long, N. J.; Petford-Long, A. K.

In: Physical Review B, Vol. 42, No. 14, 1990, p. 9182-9184.

Research output: Contribution to journalArticle

Rez, P, Weng, X, Long, NJ & Petford-Long, AK 1990, 'Plasmons in amorphous multilayer films', Physical Review B, vol. 42, no. 14, pp. 9182-9184. https://doi.org/10.1103/PhysRevB.42.9182
Rez, Peter ; Weng, X. ; Long, N. J. ; Petford-Long, A. K. / Plasmons in amorphous multilayer films. In: Physical Review B. 1990 ; Vol. 42, No. 14. pp. 9182-9184.
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