Physical characterization of photosensitive polyimide

Y. L. Zou, Terry Alford, J. W. Mayer

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

Polyimides prepared from oxydiphthalic anhydride and diamine precursors can be photosensitive. The thermal, mechanical, and dielectric properties of the polyimide films have been characterized with various techniques. The thermal decomposition temperature of the cured film is 520 °C, and the coefficient of thermal expansion is 20×10 -6/°C. The polymer chemistry and processing conditions result in a low stress (<26 MPa) in the polyimide film as measured in situ during the curing and cooling cycles. Pads of 6 μm were patterned through the photosensitive polyimide at a sensitivity of 110 mJ/cm 2 to i-line wavelength. The polyimide films exhibit anisotropy with an in-plane refractive index of 1.74 and an out-of-plane index of 1.62 measured at 632.8 nm wavelength. This indicates a preferred orientation of polymer chains in the film plane. The estimated dielectric anisotropy should be considered a major factor for device design and optimization.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMRS
Pages255-260
Number of pages6
Volume476
StatePublished - 1997
EventProceedings of the 1997 MRS Spring Meeting - San Francisco, CA, USA
Duration: Apr 1 1997Apr 4 1997

Other

OtherProceedings of the 1997 MRS Spring Meeting
CitySan Francisco, CA, USA
Period4/1/974/4/97

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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