Physical characterization of a-Si thin films deposited by thermal decomposition of iodosilanes

Chemical Compounds

• Amorphous Silicon 100%
• Dangling Bond 97%
• Rutherford Backscattering Spectroscopy 94%
• Vapor Deposition Process 89%
• Chemical Vapour Deposition 66%
• Heat Treatment 62%
• Pyrolysis 51%
• Scanning Electron Microscopy 44%
• Pressure 42%
• Fourier Transform Infrared Spectroscopy 41%
• Hydrogen 37%
• Liquid Film 35%

Engineering & Materials Science

• Thin films 69%
• Pyrolysis 69%
• Rutherford backscattering spectroscopy 68%
• Dangling bonds 67%
• Amorphous silicon 50%
• Paramagnetic resonance 50%
• Chemical vapor deposition 42%
• Argon 41%
• Atmospheric pressure 41%
• Fourier transforms 36%
• Heat treatment 32%
• Infrared radiation 31%
• Hydrogen 29%
• Scanning electron microscopy 29%

Physics & Astronomy

• thermal decomposition 81%
• characterization 40%
• thin films 37%
• amorphous silicon 33%
• electron paramagnetic resonance 33%
• backscattering 32%
• atmospheric pressure 32%
• heat treatment 29%
• argon 28%
• vapor deposition 28%
• atmospheres 26%
• scanning electron microscopy 23%
• electrical resistivity 23%
• hydrogen 22%
• spectroscopy 19%