Photoemission of the SiO2-SiC heterointerface

M. L. O'brien, C. Koitzsch, R. J. Nemanich

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

The formation of the SiO2/SiC heterojunctions is monitored by ultraviolet photoemission spectroscopy (UPS). The band bending at the interface is also monitored. Plasma processing and remote plasma enhanced chemical vapor deposition (RPECVD) were used to oxidize and deposit oxides on the surface. The heterojunction band structure for the SiC/SiO2 has been shown for 6H and 4H n-type SiC. The valence band offset was directly measured by UPS.

Original languageEnglish (US)
Pages (from-to)1776-1784
Number of pages9
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume18
Issue number3
DOIs
StatePublished - May 2000
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Photoemission of the SiO<sub>2</sub>-SiC heterointerface'. Together they form a unique fingerprint.

Cite this