Photocatalytic oxidation for point-of-use abatement of volatile organic compounds in microelectronics manufacturing

Research output: Contribution to journalConference article

10 Scopus citations

Abstract

In gas-solid heterogeneous photocatalytic oxidation (PCO), volatile organic compounds (VOCs) present in process air or air vents can be rapidly and completely oxidized to innocuous by-products over a-near-ultraviolet (UV) illuminated titanium dioxide thin film catalyst at room temperature. This class of advanced oxidation processes appears to be well-suited for point-of-use VOC abatement in the microelectronics manufacturing industry. In this article, we review industrial requirements and unresolved technical issues in the context of the recently published Semiconductor Industry Association roadmap. The specific requirements for VOC abatement from a typical photolithography track are presented. Bench-scale PCO kinetics for target VOCs are reviewed to demonstrate the typical process behavior expected.

Original languageEnglish (US)
Pages (from-to)1883-1887
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume13
Issue number4
DOIs
StatePublished - Jul 1 1995
EventProceedings of the Conference on Manufacturing Science and Technology - Denver, CO, USA
Duration: Oct 24 1994Oct 27 1994

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ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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