Phase-formation diagram for precursors to epitaxial growth of NiSi2 on Si(111)

Peter Bennett, A. P. Johnson, B. N. Halawith

Research output: Contribution to journalArticle

13 Scopus citations

Abstract

Using reflection high-energy electron diffraction and Auger microanalysis in a custom-built ultrahigh vacuum scanning electron microscope we have identified six ordered structures that precede epitaxial NiSi2 during the annealing of nickel overlayers on Si(111). A novel technique of depositing through holes in a mask positioned near the sample allows us to obtain the complete coverage dependence of these structures in a single annealing cycle. The role of these structures in relation to the NiSi2 (B) (twinned) and NiSi2 (A) (nontwinned) structures is described.

Original languageEnglish (US)
Pages (from-to)4268-4271
Number of pages4
JournalPhysical Review B
Volume37
Issue number8
DOIs
StatePublished - Jan 1 1988

ASJC Scopus subject areas

  • Condensed Matter Physics

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