Performance of customized control charts to detect process disturbances

Alejandro Heredia-Langner, Douglas C. Montgomery, George C. Runger, Connie M. Borror, Richard I. Post

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

In this paper we demonstrate the use of control charts based on orthogonal contrasts for a semiconductor manufacturing process. The statistical performance of individuals control charts based on these contrasts and their exponentially weighted moving average counterparts is compared to that of the traditional approach. Contrast-based charts have superior detection capabilities than the traditional approach when targeted at specific process disturbances.

Original languageEnglish (US)
Pages (from-to)205-218
Number of pages14
JournalQuality and Reliability Engineering International
Volume17
Issue number3
DOIs
StatePublished - May 1 2001

Keywords

  • EWMA
  • Orthogonal contrasts
  • Process monitoring
  • Semiconducter manufacturing

ASJC Scopus subject areas

  • Safety, Risk, Reliability and Quality
  • Management Science and Operations Research

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