PECVD Growth of Composition Graded SiGeSn Thin Films as Novel Approach to Limit Tin Segregation

Jignesh Vanjaria, Arul Chakkaravarthi Arjunan, Thomas Salagaj, Gary S. Tompa, Hongbin Yu

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

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Engineering & Materials Science

Chemical Compounds