PE-MOCVD of dielectric thin films: Challenges and opportunities

Sandwip Dey, Prasad V. Alluri

Research output: Contribution to journalArticle

24 Citations (Scopus)
Original languageEnglish (US)
Pages (from-to)44-48
Number of pages5
JournalMRS Bulletin
Volume21
Issue number6
StatePublished - Jun 1996

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Plasma applications
Electron cyclotron resonance
Dielectric films
Metallorganic chemical vapor deposition
electron cyclotron resonance
Perovskite
Process control
metalorganic chemical vapor deposition
mathematical models
computerized simulation
Mathematical models
Thin films
Computer simulation
thin films

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)

Cite this

PE-MOCVD of dielectric thin films : Challenges and opportunities. / Dey, Sandwip; Alluri, Prasad V.

In: MRS Bulletin, Vol. 21, No. 6, 06.1996, p. 44-48.

Research output: Contribution to journalArticle

Dey, Sandwip ; Alluri, Prasad V. / PE-MOCVD of dielectric thin films : Challenges and opportunities. In: MRS Bulletin. 1996 ; Vol. 21, No. 6. pp. 44-48.
@article{2ca17ffa0f6c45b788ccff9514c677ea,
title = "PE-MOCVD of dielectric thin films: Challenges and opportunities",
author = "Sandwip Dey and Alluri, {Prasad V.}",
year = "1996",
month = "6",
language = "English (US)",
volume = "21",
pages = "44--48",
journal = "MRS Bulletin",
issn = "0883-7694",
publisher = "Materials Research Society",
number = "6",

}

TY - JOUR

T1 - PE-MOCVD of dielectric thin films

T2 - Challenges and opportunities

AU - Dey, Sandwip

AU - Alluri, Prasad V.

PY - 1996/6

Y1 - 1996/6

UR - http://www.scopus.com/inward/record.url?scp=0030169909&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030169909&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0030169909

VL - 21

SP - 44

EP - 48

JO - MRS Bulletin

JF - MRS Bulletin

SN - 0883-7694

IS - 6

ER -