A p-channel heterostructure MISFET-like device based on a quantum well with an underlying impurity layer is discussed. The device is based on an AlGaAs/GaAs heterostructure with a recessed-gate geometry and uses Zn-diffused refractory-metal contacts. The 4100 cm**2/V-s hold mobility obtained in this inverted-interface structure at 77 K is comparable to that achieved in normal-interface AlGaAs/GaAs heterostructures. Transconductance and K-factor values as high as 52 mS/mm and 140 mS/V-mm, respectively, are obtained at 77 K in p-channel FETs with 2. 0- mu m gate lengths and 6. 0- mu m source-drain spacings, representing state-of-the-art values for p-HFETs at similar dimensions.
|Original language||English (US)|
|Journal||Electron device letters|
|State||Published - Feb 1987|
ASJC Scopus subject areas