Oxidation-induced crystallographic transformation in heavily N-doped 4H-SiC wafers

Brian Skromme, K. Palle, C. D. Poweleit, L. R. Bryant, W. M. Vetter, M. Dudley, K. Moore, T. Gehoski

Research output: Contribution to journalArticle

56 Citations (Scopus)

Abstract

A dramatic crystalline instability is observed for very heavily N-doped 4H-SiC wafers when subjected to thermal oxidation. Initially smooth wafer surfaces become dimpled and distorted in the darker central regions corresponding to original (000-1) facets on the boules. X-ray topography reveals a dense cellular network of dislocations in the deformed regions. Schottky barriers of Pt, Ni, and Ti show barrier heights that are uniformly reduced by about 0.47 V in the dimpled regions compared to the undisturbed peripheries, independent of metal work function. Photoluminescence energies are reduced by about 0.74 eV and intensities of certain Raman peaks are modified. Based on these data, the existence of thin, predominantly cubic lamellae is suspected.

Original languageEnglish (US)
Pages (from-to)455-458
Number of pages4
JournalMaterials Science Forum
Volume389-393
Issue number1
StatePublished - 2002

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Topography
Photoluminescence
Metals
wafers
boules
Crystalline materials
X rays
Oxidation
oxidation
lamella
flat surfaces
topography
photoluminescence
metals
x rays
Hot Temperature
titanium nickelide
energy

Keywords

  • Crystallographic transformation
  • Dimpling
  • Dislocations
  • Extended defects
  • Heavy doping
  • Oxidation
  • Photoluminescence
  • Raman scattering
  • Schottky barrier
  • X-ray topography

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Skromme, B., Palle, K., Poweleit, C. D., Bryant, L. R., Vetter, W. M., Dudley, M., ... Gehoski, T. (2002). Oxidation-induced crystallographic transformation in heavily N-doped 4H-SiC wafers. Materials Science Forum, 389-393(1), 455-458.

Oxidation-induced crystallographic transformation in heavily N-doped 4H-SiC wafers. / Skromme, Brian; Palle, K.; Poweleit, C. D.; Bryant, L. R.; Vetter, W. M.; Dudley, M.; Moore, K.; Gehoski, T.

In: Materials Science Forum, Vol. 389-393, No. 1, 2002, p. 455-458.

Research output: Contribution to journalArticle

Skromme, B, Palle, K, Poweleit, CD, Bryant, LR, Vetter, WM, Dudley, M, Moore, K & Gehoski, T 2002, 'Oxidation-induced crystallographic transformation in heavily N-doped 4H-SiC wafers', Materials Science Forum, vol. 389-393, no. 1, pp. 455-458.
Skromme B, Palle K, Poweleit CD, Bryant LR, Vetter WM, Dudley M et al. Oxidation-induced crystallographic transformation in heavily N-doped 4H-SiC wafers. Materials Science Forum. 2002;389-393(1):455-458.
Skromme, Brian ; Palle, K. ; Poweleit, C. D. ; Bryant, L. R. ; Vetter, W. M. ; Dudley, M. ; Moore, K. ; Gehoski, T. / Oxidation-induced crystallographic transformation in heavily N-doped 4H-SiC wafers. In: Materials Science Forum. 2002 ; Vol. 389-393, No. 1. pp. 455-458.
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