Origins of high spatial resolution secondary electron microscopy

M. R. Scheinfein, Jeffery Drucker, Jingyue Liu, J. K. Weiss, G. G. Hembree, J. M. Cowley

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

The secondary electron generation process is studied in an ultra-high vacuum scanning transmission electron microscope using electron coincidence spectroscopy. Production pathways for secondary electrons are determined by analyzing coincidences between secondary electrons and individual excitation events. The ultimate spatial resolution available in scanning electron microscopy is limited by the delocalization of the secondary electron generation process. This delocalization is studied using momentum resolved coincidence electron spectroscopy. The fraction of secondary electrons resulting from localized excitations can explain the high spatial resolution observed in secondary electron microscopy images.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
Place of PublicationPittsburgh, PA, United States
PublisherPubl by Materials Research Society
Pages253-259
Number of pages7
Volume295
ISBN (Print)1558991905
StatePublished - 1993
EventSymposium on Atomic-scale Imaging of Surfaces and Interfaces -
Duration: Nov 30 1992Dec 2 1992

Other

OtherSymposium on Atomic-scale Imaging of Surfaces and Interfaces
Period11/30/9212/2/92

Fingerprint

Electron microscopy
Electrons
Electron spectroscopy
Ultrahigh vacuum
Momentum
Electron microscopes
Spectroscopy
Scanning
Scanning electron microscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Scheinfein, M. R., Drucker, J., Liu, J., Weiss, J. K., Hembree, G. G., & Cowley, J. M. (1993). Origins of high spatial resolution secondary electron microscopy. In Materials Research Society Symposium Proceedings (Vol. 295, pp. 253-259). Pittsburgh, PA, United States: Publ by Materials Research Society.

Origins of high spatial resolution secondary electron microscopy. / Scheinfein, M. R.; Drucker, Jeffery; Liu, Jingyue; Weiss, J. K.; Hembree, G. G.; Cowley, J. M.

Materials Research Society Symposium Proceedings. Vol. 295 Pittsburgh, PA, United States : Publ by Materials Research Society, 1993. p. 253-259.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Scheinfein, MR, Drucker, J, Liu, J, Weiss, JK, Hembree, GG & Cowley, JM 1993, Origins of high spatial resolution secondary electron microscopy. in Materials Research Society Symposium Proceedings. vol. 295, Publ by Materials Research Society, Pittsburgh, PA, United States, pp. 253-259, Symposium on Atomic-scale Imaging of Surfaces and Interfaces, 11/30/92.
Scheinfein MR, Drucker J, Liu J, Weiss JK, Hembree GG, Cowley JM. Origins of high spatial resolution secondary electron microscopy. In Materials Research Society Symposium Proceedings. Vol. 295. Pittsburgh, PA, United States: Publ by Materials Research Society. 1993. p. 253-259
Scheinfein, M. R. ; Drucker, Jeffery ; Liu, Jingyue ; Weiss, J. K. ; Hembree, G. G. ; Cowley, J. M. / Origins of high spatial resolution secondary electron microscopy. Materials Research Society Symposium Proceedings. Vol. 295 Pittsburgh, PA, United States : Publ by Materials Research Society, 1993. pp. 253-259
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