Abstract
The secondary electron generation process is studied in an ultra-high vacuum scanning transmission electron microscope using electron coincidence spectroscopy. Production pathways for secondary electrons are determined by analyzing coincidences between secondary electrons and individual excitation events. The ultimate spatial resolution available in scanning electron microscopy is limited by the delocalization of the secondary electron generation process. This delocalization is studied using momentum resolved coincidence electron spectroscopy. The fraction of secondary electrons resulting from localized excitations can explain the high spatial resolution observed in secondary electron microscopy images.
| Original language | English (US) |
|---|---|
| Title of host publication | Materials Research Society Symposium Proceedings |
| Place of Publication | Pittsburgh, PA, United States |
| Publisher | Publ by Materials Research Society |
| Pages | 253-259 |
| Number of pages | 7 |
| Volume | 295 |
| ISBN (Print) | 1558991905 |
| State | Published - 1993 |
| Event | Symposium on Atomic-scale Imaging of Surfaces and Interfaces - Duration: Nov 30 1992 → Dec 2 1992 |
Other
| Other | Symposium on Atomic-scale Imaging of Surfaces and Interfaces |
|---|---|
| Period | 11/30/92 → 12/2/92 |
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ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
Cite this
Origins of high spatial resolution secondary electron microscopy. / Scheinfein, M. R.; Drucker, Jeffery; Liu, Jingyue; Weiss, J. K.; Hembree, G. G.; Cowley, J. M.
Materials Research Society Symposium Proceedings. Vol. 295 Pittsburgh, PA, United States : Publ by Materials Research Society, 1993. p. 253-259.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
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TY - GEN
T1 - Origins of high spatial resolution secondary electron microscopy
AU - Scheinfein, M. R.
AU - Drucker, Jeffery
AU - Liu, Jingyue
AU - Weiss, J. K.
AU - Hembree, G. G.
AU - Cowley, J. M.
PY - 1993
Y1 - 1993
N2 - The secondary electron generation process is studied in an ultra-high vacuum scanning transmission electron microscope using electron coincidence spectroscopy. Production pathways for secondary electrons are determined by analyzing coincidences between secondary electrons and individual excitation events. The ultimate spatial resolution available in scanning electron microscopy is limited by the delocalization of the secondary electron generation process. This delocalization is studied using momentum resolved coincidence electron spectroscopy. The fraction of secondary electrons resulting from localized excitations can explain the high spatial resolution observed in secondary electron microscopy images.
AB - The secondary electron generation process is studied in an ultra-high vacuum scanning transmission electron microscope using electron coincidence spectroscopy. Production pathways for secondary electrons are determined by analyzing coincidences between secondary electrons and individual excitation events. The ultimate spatial resolution available in scanning electron microscopy is limited by the delocalization of the secondary electron generation process. This delocalization is studied using momentum resolved coincidence electron spectroscopy. The fraction of secondary electrons resulting from localized excitations can explain the high spatial resolution observed in secondary electron microscopy images.
UR - http://www.scopus.com/inward/record.url?scp=0027251174&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0027251174&partnerID=8YFLogxK
M3 - Conference contribution
SN - 1558991905
VL - 295
SP - 253
EP - 259
BT - Materials Research Society Symposium Proceedings
PB - Publ by Materials Research Society
CY - Pittsburgh, PA, United States
ER -