TY - JOUR
T1 - Optoelectronic performance enhancement in pulsed laser deposited gallium-doped zinc oxide (GZO) films after UV laser crystallization
AU - Nian, Qiong
AU - Look, David
AU - Leedy, Kevin
AU - Cheng, Gary J.
N1 - Funding Information:
Acknowledgements The authors acknowledge the funding support from US National Research Council, and Air Force Research Laboratory.
Funding Information:
The authors acknowledge the funding support from US National Research Council, and Air Force Research Laboratory.
Publisher Copyright:
© 2018, Springer-Verlag GmbH Germany, part of Springer Nature.
PY - 2018/9/1
Y1 - 2018/9/1
N2 - This study investigates the process–microstructure–property relationship during a UV laser crystallization of a transparent conductive layer—gallium doped zinc oxide (GZO) films after pulsed laser deposition (PLD). UV laser induced crystallization technique is able to apply ultra-fast post-treatment to modify GZO films with better structural and optoelectronics properties, suggesting a potential for large-scale manufacturing. A physical simulation model coupled laser–matter interaction and heat-transfer was utilized to study pulse laser heating and heat dissipation process. The laser crystallized GZO film exhibits low resistivity of ~ 3.2 × 10−4 Ω cm, high-Hall mobility of 22 cm2/V s, and low sheet resistance of 22 Ω/sq. High-transmittance (T) over 90% at 550 nm is obtained (with glass substrate). The optoelectronic performance improved mainly attributes to grain boundary modification in the polycrystalline film, e.g., decrease of grain boundary density and passivation of electron trap at grain boundaries.
AB - This study investigates the process–microstructure–property relationship during a UV laser crystallization of a transparent conductive layer—gallium doped zinc oxide (GZO) films after pulsed laser deposition (PLD). UV laser induced crystallization technique is able to apply ultra-fast post-treatment to modify GZO films with better structural and optoelectronics properties, suggesting a potential for large-scale manufacturing. A physical simulation model coupled laser–matter interaction and heat-transfer was utilized to study pulse laser heating and heat dissipation process. The laser crystallized GZO film exhibits low resistivity of ~ 3.2 × 10−4 Ω cm, high-Hall mobility of 22 cm2/V s, and low sheet resistance of 22 Ω/sq. High-transmittance (T) over 90% at 550 nm is obtained (with glass substrate). The optoelectronic performance improved mainly attributes to grain boundary modification in the polycrystalline film, e.g., decrease of grain boundary density and passivation of electron trap at grain boundaries.
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U2 - 10.1007/s00339-018-2032-4
DO - 10.1007/s00339-018-2032-4
M3 - Article
AN - SCOPUS:85052568790
SN - 0947-8396
VL - 124
JO - Applied Physics A: Materials Science and Processing
JF - Applied Physics A: Materials Science and Processing
IS - 9
M1 - 633
ER -