Optimized process for fabrication of SrBi2Ta2O9 thin films using a novel chemical solution deposition technique

Seung Hyun Kim, D. J. Kim, K. M. Lee, M. Park, A. I. Kingon, Robert Nemanich, J. Im, S. K. Streiffer

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Ferroelectric SrBi2Ta2O9 (SBT) thin films on Pt/ZrO2/SiO2/Si were successfully prepared by using an alkanolamine-modified chemical solution deposition method. It was observed that alkanolamine provided stability to the SBT solution by retarding the hydrolysis and condensation rates. The crystallinity and the microstructure of the SBT thin films improved with increasing annealing temperature and were strongly correlated with the ferroelectric properties of the SBT thin films. The films annealed at 800 °C exhibited low leakage current density, low voltage saturation, high remanent polarization, and good fatigue characteristics at least up to 1010 switching cycles, indicating favorable behavior for memory applications.

Original languageEnglish (US)
Pages (from-to)4395-4401
Number of pages7
JournalJournal of Materials Research
Volume14
Issue number11
StatePublished - Nov 1999
Externally publishedYes

Fingerprint

Alkanolamines
Fabrication
Thin films
Ferroelectric thin films
fabrication
Remanence
thin films
Leakage currents
Ferroelectric materials
Condensation
Hydrolysis
Current density
Fatigue of materials
Annealing
Data storage equipment
low voltage
Microstructure
hydrolysis
crystallinity
Electric potential

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Kim, S. H., Kim, D. J., Lee, K. M., Park, M., Kingon, A. I., Nemanich, R., ... Streiffer, S. K. (1999). Optimized process for fabrication of SrBi2Ta2O9 thin films using a novel chemical solution deposition technique. Journal of Materials Research, 14(11), 4395-4401.

Optimized process for fabrication of SrBi2Ta2O9 thin films using a novel chemical solution deposition technique. / Kim, Seung Hyun; Kim, D. J.; Lee, K. M.; Park, M.; Kingon, A. I.; Nemanich, Robert; Im, J.; Streiffer, S. K.

In: Journal of Materials Research, Vol. 14, No. 11, 11.1999, p. 4395-4401.

Research output: Contribution to journalArticle

Kim, SH, Kim, DJ, Lee, KM, Park, M, Kingon, AI, Nemanich, R, Im, J & Streiffer, SK 1999, 'Optimized process for fabrication of SrBi2Ta2O9 thin films using a novel chemical solution deposition technique', Journal of Materials Research, vol. 14, no. 11, pp. 4395-4401.
Kim, Seung Hyun ; Kim, D. J. ; Lee, K. M. ; Park, M. ; Kingon, A. I. ; Nemanich, Robert ; Im, J. ; Streiffer, S. K. / Optimized process for fabrication of SrBi2Ta2O9 thin films using a novel chemical solution deposition technique. In: Journal of Materials Research. 1999 ; Vol. 14, No. 11. pp. 4395-4401.
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