Optimization of Light-Induced Al Plating on Si for Substitution of Ag in Si Solar Cells

Lewis Ricci, Mao Feng Tseng, Woo Jung Shin, Meng Tao, Yunyu Liu, Fangdan Jiang, Guoqiang Xing

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper focuses on optimization of the light-induced Al plating process to promote a dense adherent film to the Si solar cell as the front electrode. Electrochemical capacitance-voltage and sheet resistance measurements were used to optimize the laser patterning process for the SiNx layer. A recipe to remove contaminants and laser damage on the Si surface after SiNx patterning was developed. Atomic force microscopy revealed the minimum etch time to remove all the original Si surface which was damaged and contaminated. Various plating conditions including temperature, plating voltage, and light intensity were investigated. The lowest Al resistivity obtained is 4\times 10^{-6}\ \mathrm{\Omega}-\mathrm{cm}, which is comparable to that of electroplated Cu.

Original languageEnglish (US)
Title of host publication2020 47th IEEE Photovoltaic Specialists Conference, PVSC 2020
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages267-270
Number of pages4
ISBN (Electronic)9781728161150
DOIs
StatePublished - Jun 14 2020
Event47th IEEE Photovoltaic Specialists Conference, PVSC 2020 - Calgary, Canada
Duration: Jun 15 2020Aug 21 2020

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
Volume2020-June
ISSN (Print)0160-8371

Conference

Conference47th IEEE Photovoltaic Specialists Conference, PVSC 2020
Country/TerritoryCanada
CityCalgary
Period6/15/208/21/20

Keywords

  • aluminum
  • metallization
  • photo-induced plating
  • silicon solar cell

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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