@inproceedings{0188e7b2ad374c8a9294b33f66a507d6,
title = "Optimization of Light-Induced Al Plating on Si for Substitution of Ag in Si Solar Cells",
abstract = "This paper focuses on optimization of the light-induced Al plating process to promote a dense adherent film to the Si solar cell as the front electrode. Electrochemical capacitance-voltage and sheet resistance measurements were used to optimize the laser patterning process for the SiNx layer. A recipe to remove contaminants and laser damage on the Si surface after SiNx patterning was developed. Atomic force microscopy revealed the minimum etch time to remove all the original Si surface which was damaged and contaminated. Various plating conditions including temperature, plating voltage, and light intensity were investigated. The lowest Al resistivity obtained is 4\times 10^{-6}\ \mathrm{\Omega}-\mathrm{cm}, which is comparable to that of electroplated Cu.",
keywords = "aluminum, metallization, photo-induced plating, silicon solar cell",
author = "Lewis Ricci and Tseng, {Mao Feng} and Shin, {Woo Jung} and Meng Tao and Yunyu Liu and Fangdan Jiang and Guoqiang Xing",
note = "Funding Information: This work is partially funded by the US Department of Energy under award no. DE-EE0008150. Publisher Copyright: {\textcopyright} 2020 IEEE.; 47th IEEE Photovoltaic Specialists Conference, PVSC 2020 ; Conference date: 15-06-2020 Through 21-08-2020",
year = "2020",
month = jun,
day = "14",
doi = "10.1109/PVSC45281.2020.9300390",
language = "English (US)",
series = "Conference Record of the IEEE Photovoltaic Specialists Conference",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "267--270",
booktitle = "2020 47th IEEE Photovoltaic Specialists Conference, PVSC 2020",
}