Optimal control for increasing throughput in low pressure chemical vapor deposition

Lijuan Song, Sisan Shen, Konstantinos Tsakalis, Peter E. Crouch, Timothy S. Cale

Research output: Chapter in Book/Report/Conference proceedingChapter

5 Scopus citations

Abstract

We present the application of optimal control theory to the process of low pressure chemical vapor deposition (LPCVD) on patterned surfaces. An optimally controlled CVD protocol is developed by employing an approximate feature scale model, based on the simultaneous one-dimensional Knudsen diffusion and chemical reaction description of LPCVD, for the specific problem of maximizing throughput for a specified step coverage. The corresponding control conditions for the reactor are obtained by an adaptive solution of the inverse problem for the reactor scale model. Rigorous process simulations demonstrate that the computed temperature and partial pressure trajectories provide good step coverage.

Original languageEnglish (US)
Title of host publicationProceedings of the IEEE Conference on Decision and Control
Editors Anon
Pages4831-4836
Number of pages6
StatePublished - Dec 1 1996
EventProceedings of the 35th IEEE Conference on Decision and Control. Part 4 (of 4) - Kobe, Jpn
Duration: Dec 11 1996Dec 13 1996

Publication series

NameProceedings of the IEEE Conference on Decision and Control
Volume4
ISSN (Print)0191-2216

Other

OtherProceedings of the 35th IEEE Conference on Decision and Control. Part 4 (of 4)
CityKobe, Jpn
Period12/11/9612/13/96

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Modeling and Simulation
  • Control and Optimization

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