@inbook{e17779bf396e48abbab04b7cf467a30e,
title = "Optimal control for increasing throughput in low pressure chemical vapor deposition",
abstract = "We present the application of optimal control theory to the process of low pressure chemical vapor deposition (LPCVD) on patterned surfaces. An optimally controlled CVD protocol is developed by employing an approximate feature scale model, based on the simultaneous one-dimensional Knudsen diffusion and chemical reaction description of LPCVD, for the specific problem of maximizing throughput for a specified step coverage. The corresponding control conditions for the reactor are obtained by an adaptive solution of the inverse problem for the reactor scale model. Rigorous process simulations demonstrate that the computed temperature and partial pressure trajectories provide good step coverage.",
author = "Lijuan Song and Sisan Shen and Konstantinos Tsakalis and Crouch, {Peter E.} and Cale, {Timothy S.}",
year = "1996",
language = "English (US)",
series = "Proceedings of the IEEE Conference on Decision and Control",
pages = "4831--4836",
editor = "Anon",
booktitle = "Proceedings of the IEEE Conference on Decision and Control",
note = "Proceedings of the 35th IEEE Conference on Decision and Control. Part 4 (of 4) ; Conference date: 11-12-1996 Through 13-12-1996",
}