Mathematics
MOCVD
100%
Ammonia
80%
Optical Properties
75%
Flow Rate
62%
Substrate
55%
Facet
50%
Growth Conditions
32%
Sapphire
30%
Photoluminescence
30%
Chemical Vapor Deposition
30%
Etching
25%
Carbon
20%
Recombination
19%
Vertical
14%
Optimization
12%
Engineering & Materials Science
Metallorganic chemical vapor deposition
75%
Optical properties
59%
Substrates
34%
Ammonia
30%
Flow rate
21%
Photoluminescence
15%
Anisotropic etching
15%
Wet etching
13%
Sapphire
12%
Carbon
7%
Temperature
3%
Physics & Astronomy
metalorganic chemical vapor deposition
45%
optical properties
31%
ammonia
29%
flat surfaces
25%
flow velocity
23%
low pressure
16%
pressure chambers
12%
habits
11%
grooves
9%
sapphire
8%
etching
7%
photoluminescence
6%
carbon
6%
optimization
6%
temperature
2%
Chemical Compounds
Flow Kinetics
37%
Ammonia
36%
Optical Property
35%
Pressure
27%
Etching
14%
Chemical Vapour Deposition
14%
Photoluminescence
12%
Liquid Film
7%
Carbon Atom
7%