One nanometer structure fabrication using electron beam induced deposition

W. F. van Dorp, C. W. Hagen, Peter Crozier, B. van Someren, P. Kruit

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

We have recently demonstrated that electron beam induced deposition can be used to fabricate structures that are much smaller than was generally believed, even as small as 1 nm in size. When fabricating arrays of such small structures a spread in deposited mass is observed, as well as a spread in position of the deposit with respect to the intended array position. In this work we study the distribution of masses by analysing arrays of tungsten containing dots, deposited on 10 nm thick carbon foils, at decreasing deposition times. The observed distributions of mass resemble closely a Poisson distribution, and the average amount of mass deposited in a dot is found to decrease linearly with decreasing deposition time. As the number of atoms in such small deposits is getting very small (of the order of 100) the statistical variations are becoming significant. This may set a limit on the accuracy with which structure sizes can be defined.

Original languageEnglish (US)
Pages (from-to)1468-1470
Number of pages3
JournalMicroelectronic Engineering
Volume83
Issue number4-9 SPEC. ISS.
DOIs
StatePublished - Apr 2006

Fingerprint

Electron beams
electron beams
Fabrication
fabrication
Deposits
Poisson distribution
Tungsten
deposits
Metal foil
Carbon
foils
Atoms
tungsten
carbon
atoms

Keywords

  • Electron beam induced deposition
  • Electron microscope
  • Nanolithography
  • Nanostructures

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

Cite this

One nanometer structure fabrication using electron beam induced deposition. / van Dorp, W. F.; Hagen, C. W.; Crozier, Peter; van Someren, B.; Kruit, P.

In: Microelectronic Engineering, Vol. 83, No. 4-9 SPEC. ISS., 04.2006, p. 1468-1470.

Research output: Contribution to journalArticle

van Dorp, WF, Hagen, CW, Crozier, P, van Someren, B & Kruit, P 2006, 'One nanometer structure fabrication using electron beam induced deposition', Microelectronic Engineering, vol. 83, no. 4-9 SPEC. ISS., pp. 1468-1470. https://doi.org/10.1016/j.mee.2006.01.155
van Dorp, W. F. ; Hagen, C. W. ; Crozier, Peter ; van Someren, B. ; Kruit, P. / One nanometer structure fabrication using electron beam induced deposition. In: Microelectronic Engineering. 2006 ; Vol. 83, No. 4-9 SPEC. ISS. pp. 1468-1470.
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