On the mechanism of silicon nitride chemical vapor deposition from dichlorosilane and ammonia

Physics & Astronomy

• ammonia 83%
• silicon nitrides 80%
• vapor phases 66%
• vapor deposition 63%
• surface reactions 56%
• rice 33%
• gases 28%
• elimination 27%
• reaction kinetics 24%
• activation 21%
• density functional theory 21%
• decomposition 20%
• wafers 20%
• activation energy 20%
• kinetics 16%

Engineering & Materials Science

• Silicon nitride 100%
• Chemical vapor deposition 96%
• Ammonia 88%
• Film growth 52%
• Surface reactions 47%
• Gases 47%
• Density functional theory 24%
• Rate constants 20%
• Reaction rates 18%
• Activation energy 17%
• Chemical activation 14%
• Decomposition 11%

Chemical Compounds

• Nitride 79%
• Chemical Vapour Deposition 74%
• Ammonia 62%
• Liquid Film 39%
• Bimolecular Reaction 34%
• Transition State Theory 32%
• Reaction Rate Constant 29%
• Reaction Path 29%
• Surface Reaction 28%
• Reaction Activation Energy 19%
• Decomposition 17%
• Density Functional Theory 17%
• Gas 14%
• Mixture 12%