On the mechanism of silicon nitride chemical vapor deposition from dichlorosilane and ammonia

Engineering & Materials Science

• Silicon nitride 100%
• Chemical vapor deposition 96%
• Ammonia 88%
• Film growth 52%
• Surface reactions 47%
• Gases 47%
• Density functional theory 24%
• Rate constants 20%
• Reaction rates 18%
• Activation energy 17%
• Chemical activation 14%
• Decomposition 11%

Chemical Compounds

• Nitride 79%
• Chemical Vapour Deposition 74%
• Ammonia 62%
• Liquid Film 39%
• Bimolecular Reaction 34%
• Transition State Theory 32%
• Reaction Rate Constant 29%
• Reaction Path 29%
• Surface Reaction 28%
• Reaction Activation Energy 19%
• Decomposition 17%
• Density Functional Theory 17%
• Gas 14%
• Mixture 12%