On the kinetic study of electrochemical vapour deposition

L. G.J. de Haart, Y. S. Lin, K. J. de Vries, A. J. Burggraaf

Research output: Contribution to journalArticle

7 Scopus citations

Abstract

A theoretical analysis is presented which quantitatively describes the transition behavior of the kinetics of the electrochemical vapour deposition of yttria-stabilized zirconia on porous substrates. It is shown that up to a certain deposition time and corresponding film thickness the rate limiting step is oxygen diffusion through the substrate pores, giving a linear dependence of the film thickness on the deposition time. For longer deposition times, i.e. thicker films, a transition of the rate limiting step to bulk electrochemical diffusion in the film occurs, resulting in a parabolic dependence of the film thickness on the deposition time. Simulation results are presented to show the effects of the experimental conditions on this transition time.

Original languageEnglish (US)
Pages (from-to)331-336
Number of pages6
JournalSolid State Ionics
Volume47
Issue number3-4
DOIs
StatePublished - Sep 1991

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ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

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