On the kinetic study of electrochemical vapour deposition

L. G J de Haart, Jerry Lin, K. J. de Vries, A. J. Burggraaf

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

A theoretical analysis is presented which quantitatively describes the transition behavior of the kinetics of the electrochemical vapour deposition of yttria-stabilized zirconia on porous substrates. It is shown that up to a certain deposition time and corresponding film thickness the rate limiting step is oxygen diffusion through the substrate pores, giving a linear dependence of the film thickness on the deposition time. For longer deposition times, i.e. thicker films, a transition of the rate limiting step to bulk electrochemical diffusion in the film occurs, resulting in a parabolic dependence of the film thickness on the deposition time. Simulation results are presented to show the effects of the experimental conditions on this transition time.

Original languageEnglish (US)
Pages (from-to)331-336
Number of pages6
JournalSolid State Ionics
Volume47
Issue number3-4
DOIs
StatePublished - 1991
Externally publishedYes

Fingerprint

Vapor deposition
vapor deposition
Film thickness
Kinetics
kinetics
film thickness
Yttria stabilized zirconia
Substrates
Thick films
yttria-stabilized zirconia
thick films
Oxygen
porosity
oxygen
simulation

ASJC Scopus subject areas

  • Electrochemistry
  • Physical and Theoretical Chemistry
  • Energy Engineering and Power Technology
  • Materials Chemistry
  • Condensed Matter Physics

Cite this

de Haart, L. G. J., Lin, J., de Vries, K. J., & Burggraaf, A. J. (1991). On the kinetic study of electrochemical vapour deposition. Solid State Ionics, 47(3-4), 331-336. https://doi.org/10.1016/0167-2738(91)90256-B

On the kinetic study of electrochemical vapour deposition. / de Haart, L. G J; Lin, Jerry; de Vries, K. J.; Burggraaf, A. J.

In: Solid State Ionics, Vol. 47, No. 3-4, 1991, p. 331-336.

Research output: Contribution to journalArticle

de Haart, LGJ, Lin, J, de Vries, KJ & Burggraaf, AJ 1991, 'On the kinetic study of electrochemical vapour deposition', Solid State Ionics, vol. 47, no. 3-4, pp. 331-336. https://doi.org/10.1016/0167-2738(91)90256-B
de Haart, L. G J ; Lin, Jerry ; de Vries, K. J. ; Burggraaf, A. J. / On the kinetic study of electrochemical vapour deposition. In: Solid State Ionics. 1991 ; Vol. 47, No. 3-4. pp. 331-336.
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