On the dose-rate threshold of beam damage in TEM

Nan Jiang; John Spence

doi:10.1016/j.ultramic.2011.11.016

On the dose-rate threshold of beam damage in TEM

Nan Jiang, John Spence

Research output: Contribution to journal › Article › peer-review

75 Scopus citations

Abstract

Electron beam damage in a CaF ₂-Al ₂O ₃-SiO ₂ glass is investigated using time-dependent Ca L ₂₃ and O K-edge electron energy-loss spectroscopy. It appears that there is a threshold dose rate, below which the damage involving the formation of O defects may not be detected, at any total dose. This suggests that the threshold phenomenon of dose rate may result from the competition of damage and recovery processes. The accumulation of damage can only occur when the damage rate is higher than the recovery rate. For surface sputtering process in TEM, the recovery rate is negligible. Therefore, there is no threshold dose rate for surface sputtering.

Original language	English (US)
Pages (from-to)	77-82
Number of pages	6
Journal	Ultramicroscopy
Volume	113
DOIs	https://doi.org/10.1016/j.ultramic.2011.11.016
State	Published - Feb 2012

Keywords

(S)TEM
Beam damage
Dose rate threshold
EELS

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Instrumentation

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10.1016/j.ultramic.2011.11.016

Cite this

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title = "On the dose-rate threshold of beam damage in TEM",

abstract = "Electron beam damage in a CaF 2-Al 2O 3-SiO 2 glass is investigated using time-dependent Ca L 23 and O K-edge electron energy-loss spectroscopy. It appears that there is a threshold dose rate, below which the damage involving the formation of O defects may not be detected, at any total dose. This suggests that the threshold phenomenon of dose rate may result from the competition of damage and recovery processes. The accumulation of damage can only occur when the damage rate is higher than the recovery rate. For surface sputtering process in TEM, the recovery rate is negligible. Therefore, there is no threshold dose rate for surface sputtering.",

keywords = "(S)TEM, Beam damage, Dose rate threshold, EELS",

author = "Nan Jiang and John Spence",

note = "Funding Information: This work is supported by DOE award DE-FG52-09NA29451 . The CaF 2 –Al 2 O 3 –SiO 2 glass was synthesized by Dr. S. Ye of Tongji University of China. The use of facilities within the Center for Solid State Science at ASU is also acknowledged.",

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AU - Jiang, Nan

AU - Spence, John

N1 - Funding Information: This work is supported by DOE award DE-FG52-09NA29451 . The CaF 2 –Al 2 O 3 –SiO 2 glass was synthesized by Dr. S. Ye of Tongji University of China. The use of facilities within the Center for Solid State Science at ASU is also acknowledged.

PY - 2012/2

Y1 - 2012/2

N2 - Electron beam damage in a CaF 2-Al 2O 3-SiO 2 glass is investigated using time-dependent Ca L 23 and O K-edge electron energy-loss spectroscopy. It appears that there is a threshold dose rate, below which the damage involving the formation of O defects may not be detected, at any total dose. This suggests that the threshold phenomenon of dose rate may result from the competition of damage and recovery processes. The accumulation of damage can only occur when the damage rate is higher than the recovery rate. For surface sputtering process in TEM, the recovery rate is negligible. Therefore, there is no threshold dose rate for surface sputtering.

AB - Electron beam damage in a CaF 2-Al 2O 3-SiO 2 glass is investigated using time-dependent Ca L 23 and O K-edge electron energy-loss spectroscopy. It appears that there is a threshold dose rate, below which the damage involving the formation of O defects may not be detected, at any total dose. This suggests that the threshold phenomenon of dose rate may result from the competition of damage and recovery processes. The accumulation of damage can only occur when the damage rate is higher than the recovery rate. For surface sputtering process in TEM, the recovery rate is negligible. Therefore, there is no threshold dose rate for surface sputtering.

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KW - Beam damage

KW - Dose rate threshold

KW - EELS

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On the dose-rate threshold of beam damage in TEM

Abstract

Keywords

ASJC Scopus subject areas

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