TY - GEN
T1 - On the bias dependence of time exponent in NBTI and CHC effects
AU - Velamala, Jyothi B.
AU - Reddy, Vijay
AU - Zheng, Rui
AU - Krishnan, Srikanth
AU - Cao, Yu
PY - 2010
Y1 - 2010
N2 - NBTI and CHC are two leading reliability concerns. Their degradation rate, which is represented by the time exponent (n), varies with multiple factors, such as the measurement method and bias voltages (i.e., different n for sub-threshold or linear current). Such a variation significantly affects the long-term prediction of circuit lifetime. By investigating the underlying mechanisms and silicon data, we conclude that the bias dependence is due to intrinsic device non-linearity. With a unified aging model of threshold voltage (Vth) shift, different time exponents in different operation regions are consistently explained. The proposed solution captures the change of n under various supply voltages (Vdd), as validated with silicon data from transistors and RO measurement. It helps improve the accuracy in reliability prediction, reducing unnecessary design margins. Based on the result, the device and circuit lifetime is expected to be enhanced operating at lower V dd due to the reduction in the time exponent.
AB - NBTI and CHC are two leading reliability concerns. Their degradation rate, which is represented by the time exponent (n), varies with multiple factors, such as the measurement method and bias voltages (i.e., different n for sub-threshold or linear current). Such a variation significantly affects the long-term prediction of circuit lifetime. By investigating the underlying mechanisms and silicon data, we conclude that the bias dependence is due to intrinsic device non-linearity. With a unified aging model of threshold voltage (Vth) shift, different time exponents in different operation regions are consistently explained. The proposed solution captures the change of n under various supply voltages (Vdd), as validated with silicon data from transistors and RO measurement. It helps improve the accuracy in reliability prediction, reducing unnecessary design margins. Based on the result, the device and circuit lifetime is expected to be enhanced operating at lower V dd due to the reduction in the time exponent.
KW - CHC
KW - NBTI
KW - Reaction-diffusion
KW - Temporal degradation
KW - Time exponent
UR - http://www.scopus.com/inward/record.url?scp=77957929309&partnerID=8YFLogxK
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U2 - 10.1109/IRPS.2010.5488754
DO - 10.1109/IRPS.2010.5488754
M3 - Conference contribution
AN - SCOPUS:77957929309
SN - 9781424454310
T3 - IEEE International Reliability Physics Symposium Proceedings
SP - 650
EP - 654
BT - 2010 IEEE International Reliability Physics Symposium, IRPS 2010
T2 - 2010 IEEE International Reliability Physics Symposium, IRPS 2010
Y2 - 2 May 2010 through 6 May 2010
ER -