Abstract
The random dopant fluctuation (RDF) of double gate (DG) MOSFET based 6-T SRAM is investigated with three-dimensional (3-D) statistical simulation. The doping profile is generated by matlab and the threshold voltage variation due to RDF is obtained by device simulation. Then the performance of DG MOSFET based 6-T SRAM is evaluated by feeding the results into a compact DG MOSFET model using HSPICE Monte Carlo simulation. The results show that pull down transistor dominates static noise margin (SNM) fluctuation and access transistor dominates write margin (WM) fluctuation.
Original language | English (US) |
---|---|
Title of host publication | Technical Proceedings of the 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011 |
Pages | 172-175 |
Number of pages | 4 |
State | Published - 2011 |
Externally published | Yes |
Event | Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011 - Boston, MA, United States Duration: Jun 13 2011 → Jun 16 2011 |
Publication series
Name | Technical Proceedings of the 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011 |
---|---|
Volume | 2 |
Other
Other | Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011 |
---|---|
Country/Territory | United States |
City | Boston, MA |
Period | 6/13/11 → 6/16/11 |
ASJC Scopus subject areas
- Hardware and Architecture
- Electrical and Electronic Engineering