Abstract
Hot carrier injection (HCI) is one of the critical de-vice degradation mechanisms, and is conventionally characterized with constant voltage stress (CVS) method. A novel voltage-step stress (VSS) methodology is pro-posed to quickly characterize HCI degradation, based on a simplified reaction-diffusion model. This wafer-level reliability qualification methodology for HCI requires only one single device, and the total test time can be con-trolled within 2 hours. Therefore, this new technique can be an effective tool for fast reliability screening for HCI during process development in the future.
Original language | English (US) |
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Title of host publication | Proceedings - 2014 IEEE 12th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
ISBN (Print) | 9781479932962 |
DOIs | |
State | Published - Jan 23 2014 |
Event | 2014 12th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014 - Guilin, China Duration: Oct 28 2014 → Oct 31 2014 |
Other
Other | 2014 12th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014 |
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Country/Territory | China |
City | Guilin |
Period | 10/28/14 → 10/31/14 |
ASJC Scopus subject areas
- Hardware and Architecture
- Electrical and Electronic Engineering
- Computer Science Applications