Nonlithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

Winston Chern, Keng Hsu, Ik Su Chun, Bruno Azeredo, Numair Ahmed, Kyou Hyun Kim, Jian Min Zuo, Nick Fang, Placid Ferreira, Xiuling Li

Research output: Contribution to journalArticle

157 Citations (Scopus)

Abstract

Semiconductor nanowires have potential applications in photovoltaics, batteries, and thermoelectrics. We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. Strong light emission in the entire visible and near infrared wavelength range at room temperature, tunable by etching condition, attributed to surface features, and enhanced by silver surface plasmon, is demonstrated.

Original languageEnglish (US)
Pages (from-to)1582-1588
Number of pages7
JournalNano Letters
Volume10
Issue number5
DOIs
StatePublished - May 12 2010
Externally publishedYes

Fingerprint

Silicon
Nanowires
Etching
nanowires
manufacturing
Metals
etching
stamping
Stamping
Light emission
silicon
Silver
metals
light emission
electric batteries
Optical properties
silver
Semiconductor materials
Infrared radiation
solid state

Keywords

  • Light-emitting
  • Metal-assisted-chemical-etching (MacEtch)
  • S4
  • Sidewall roughness
  • Silicon nanowire

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanical Engineering

Cite this

Nonlithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. / Chern, Winston; Hsu, Keng; Chun, Ik Su; Azeredo, Bruno; Ahmed, Numair; Kim, Kyou Hyun; Zuo, Jian Min; Fang, Nick; Ferreira, Placid; Li, Xiuling.

In: Nano Letters, Vol. 10, No. 5, 12.05.2010, p. 1582-1588.

Research output: Contribution to journalArticle

Chern, W, Hsu, K, Chun, IS, Azeredo, B, Ahmed, N, Kim, KH, Zuo, JM, Fang, N, Ferreira, P & Li, X 2010, 'Nonlithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays', Nano Letters, vol. 10, no. 5, pp. 1582-1588. https://doi.org/10.1021/nl903841a
Chern, Winston ; Hsu, Keng ; Chun, Ik Su ; Azeredo, Bruno ; Ahmed, Numair ; Kim, Kyou Hyun ; Zuo, Jian Min ; Fang, Nick ; Ferreira, Placid ; Li, Xiuling. / Nonlithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. In: Nano Letters. 2010 ; Vol. 10, No. 5. pp. 1582-1588.
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