Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

W. Chern; K. Hsu; I. Chun; B. Azeredo; N. Fang; P. Ferreira; X. Li

doi:10.1364/cleo.2010.cthv6

Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

W. Chern, K. Hsu, I. Chun, B. Azeredo, N. Fang, P. Ferreira, X. Li

Polytechnic School, The (PS)

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.

Original language	English (US)
Title of host publication	Conference on Lasers and Electro-Optics, CLEO 2010
Publisher	Optical Society of America (OSA)
ISBN (Print)	9781557528896
DOIs	https://doi.org/10.1364/cleo.2010.cthv6
State	Published - 2010
Event	Conference on Lasers and Electro-Optics, CLEO 2010 - San Jose, CA, United States Duration: May 16 2010 → May 21 2010

Publication series

Name	Optics InfoBase Conference Papers
ISSN (Electronic)	2162-2701

Other

Other	Conference on Lasers and Electro-Optics, CLEO 2010
Country/Territory	United States
City	San Jose, CA
Period	5/16/10 → 5/21/10

ASJC Scopus subject areas

Instrumentation
Atomic and Molecular Physics, and Optics

Access to Document

10.1364/cleo.2010.cthv6

Cite this

Chern, W., Hsu, K., Chun, I., Azeredo, B., Fang, N., Ferreira, P., & Li, X. (2010). Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. In Conference on Lasers and Electro-Optics, CLEO 2010 (Optics InfoBase Conference Papers). Optical Society of America (OSA). https://doi.org/10.1364/cleo.2010.cthv6

Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. / Chern, W.; Hsu, K.; Chun, I.; Azeredo, B.; Fang, N.; Ferreira, P.; Li, X.

Conference on Lasers and Electro-Optics, CLEO 2010. Optical Society of America (OSA), 2010. (Optics InfoBase Conference Papers).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Chern, W, Hsu, K, Chun, I, Azeredo, B, Fang, N, Ferreira, P & Li, X 2010, Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. in Conference on Lasers and Electro-Optics, CLEO 2010. Optics InfoBase Conference Papers, Optical Society of America (OSA), Conference on Lasers and Electro-Optics, CLEO 2010, San Jose, CA, United States, 5/16/10. https://doi.org/10.1364/cleo.2010.cthv6

@inproceedings{3c3ee2409e4f48d2967ea1b5c8da3838,

title = "Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays",

abstract = "We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.",

author = "W. Chern and K. Hsu and I. Chun and B. Azeredo and N. Fang and P. Ferreira and X. Li",

year = "2010",

doi = "10.1364/cleo.2010.cthv6",

language = "English (US)",

isbn = "9781557528896",

series = "Optics InfoBase Conference Papers",

publisher = "Optical Society of America (OSA)",

booktitle = "Conference on Lasers and Electro-Optics, CLEO 2010",

note = "Conference on Lasers and Electro-Optics, CLEO 2010 ; Conference date: 16-05-2010 Through 21-05-2010",

}

TY - GEN

T1 - Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

AU - Chern, W.

AU - Hsu, K.

AU - Chun, I.

AU - Azeredo, B.

AU - Fang, N.

AU - Ferreira, P.

AU - Li, X.

PY - 2010

Y1 - 2010

N2 - We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.

AB - We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.

UR - http://www.scopus.com/inward/record.url?scp=85086614083&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85086614083&partnerID=8YFLogxK

U2 - 10.1364/cleo.2010.cthv6

DO - 10.1364/cleo.2010.cthv6

M3 - Conference contribution

AN - SCOPUS:85086614083

SN - 9781557528896

T3 - Optics InfoBase Conference Papers

BT - Conference on Lasers and Electro-Optics, CLEO 2010

PB - Optical Society of America (OSA)

T2 - Conference on Lasers and Electro-Optics, CLEO 2010

Y2 - 16 May 2010 through 21 May 2010

ER -

Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

Abstract

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ASJC Scopus subject areas

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