TY - GEN
T1 - Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays
AU - Chern, W.
AU - Hsu, K.
AU - Chun, I.
AU - Azeredo, B.
AU - Fang, N.
AU - Ferreira, P.
AU - Li, X.
N1 - Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2010
Y1 - 2010
N2 - We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.
AB - We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.
UR - http://www.scopus.com/inward/record.url?scp=85086614083&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85086614083&partnerID=8YFLogxK
U2 - 10.1364/cleo.2010.cthv6
DO - 10.1364/cleo.2010.cthv6
M3 - Conference contribution
AN - SCOPUS:85086614083
SN - 9781557528896
T3 - Optics InfoBase Conference Papers
BT - Conference on Lasers and Electro-Optics, CLEO 2010
PB - Optical Society of America (OSA)
T2 - Conference on Lasers and Electro-Optics, CLEO 2010
Y2 - 16 May 2010 through 21 May 2010
ER -