Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

W. Chern; K. Hsu; I. Chun; B. Azeredo; N. Fang; P. Ferreira; X. Li

Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

W. Chern, K. Hsu, I. Chun, B. Azeredo, N. Fang, P. Ferreira, X. Li

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We report a top-down fabrication method that involves the combination of superionic-solid-statestamping (S4) patterning with metal-assisted-chemical- etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.

Original language	English (US)
Title of host publication	Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference
Subtitle of host publication	2010 Laser Science to Photonic Applications, CLEO/QELS 2010
State	Published - 2010
Externally published	Yes
Event	Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010 - San Jose, CA, United States Duration: May 16 2010 → May 21 2010

Publication series

Name	Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010

Other

Other	Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010
Country/Territory	United States
City	San Jose, CA
Period	5/16/10 → 5/21/10

ASJC Scopus subject areas

Electrical and Electronic Engineering
Radiation

Cite this

Chern, W., Hsu, K., Chun, I., Azeredo, B., Fang, N., Ferreira, P., & Li, X. (2010). Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. In Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010 Article 5500293 (Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010).

Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. / Chern, W.; Hsu, K.; Chun, I. et al.
Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010. 2010. 5500293 (Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Chern, W, Hsu, K, Chun, I, Azeredo, B, Fang, N, Ferreira, P & Li, X 2010, Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. in Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010., 5500293, Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010, Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010, San Jose, CA, United States, 5/16/10.

Chern W, Hsu K, Chun I, Azeredo B, Fang N, Ferreira P et al. Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. In Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010. 2010. 5500293. (Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010).

Chern, W. ; Hsu, K. ; Chun, I. et al. / Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010. 2010. (Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010).

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abstract = "We report a top-down fabrication method that involves the combination of superionic-solid-statestamping (S4) patterning with metal-assisted-chemical- etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.",

author = "W. Chern and K. Hsu and I. Chun and B. Azeredo and N. Fang and P. Ferreira and X. Li",

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AU - Chern, W.

AU - Hsu, K.

AU - Chun, I.

AU - Azeredo, B.

AU - Fang, N.

AU - Ferreira, P.

AU - Li, X.

PY - 2010

Y1 - 2010

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AB - We report a top-down fabrication method that involves the combination of superionic-solid-statestamping (S4) patterning with metal-assisted-chemical- etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.

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BT - Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference

T2 - Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010

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Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

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