Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

W. Chern, K. Hsu, I. Chun, Bruno Azeredo, N. Fang, P. Ferreira, X. Li

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.

Original languageEnglish (US)
Title of host publicationOptics InfoBase Conference Papers
StatePublished - 2010
Externally publishedYes
EventConference on Lasers and Electro-Optics, CLEO 2010 - San Jose, CA, United States
Duration: May 16 2010May 21 2010

Other

OtherConference on Lasers and Electro-Optics, CLEO 2010
CountryUnited States
CitySan Jose, CA
Period5/16/105/21/10

Fingerprint

stamping
Stamping
Nanowires
Etching
nanowires
manufacturing
Optical properties
etching
solid state
optical properties
Fabrication
Silicon
fabrication
Geometry
silicon
geometry
Metals
metals

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Chern, W., Hsu, K., Chun, I., Azeredo, B., Fang, N., Ferreira, P., & Li, X. (2010). Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. In Optics InfoBase Conference Papers

Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. / Chern, W.; Hsu, K.; Chun, I.; Azeredo, Bruno; Fang, N.; Ferreira, P.; Li, X.

Optics InfoBase Conference Papers. 2010.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Chern, W, Hsu, K, Chun, I, Azeredo, B, Fang, N, Ferreira, P & Li, X 2010, Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. in Optics InfoBase Conference Papers. Conference on Lasers and Electro-Optics, CLEO 2010, San Jose, CA, United States, 5/16/10.
Chern, W. ; Hsu, K. ; Chun, I. ; Azeredo, Bruno ; Fang, N. ; Ferreira, P. ; Li, X. / Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays. Optics InfoBase Conference Papers. 2010.
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AU - Ferreira, P.

AU - Li, X.

PY - 2010

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